JPS59134891A - プリント基板洗浄液 - Google Patents
プリント基板洗浄液Info
- Publication number
- JPS59134891A JPS59134891A JP744083A JP744083A JPS59134891A JP S59134891 A JPS59134891 A JP S59134891A JP 744083 A JP744083 A JP 744083A JP 744083 A JP744083 A JP 744083A JP S59134891 A JPS59134891 A JP S59134891A
- Authority
- JP
- Japan
- Prior art keywords
- printed circuit
- cleaning
- substrate
- water
- board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 25
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 description 13
- 238000002845 discoloration Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- -1 gold ions Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- NCHBYORVPVDWBJ-UHFFFAOYSA-N 2-(3-methylbutoxy)ethanol Chemical compound CC(C)CCOCCO NCHBYORVPVDWBJ-UHFFFAOYSA-N 0.000 description 1
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000013040 bath agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000004649 discoloration prevention Methods 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Detergent Compositions (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP744083A JPS59134891A (ja) | 1983-01-21 | 1983-01-21 | プリント基板洗浄液 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP744083A JPS59134891A (ja) | 1983-01-21 | 1983-01-21 | プリント基板洗浄液 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59134891A true JPS59134891A (ja) | 1984-08-02 |
JPH0144033B2 JPH0144033B2 (enrdf_load_stackoverflow) | 1989-09-25 |
Family
ID=11665918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP744083A Granted JPS59134891A (ja) | 1983-01-21 | 1983-01-21 | プリント基板洗浄液 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59134891A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824763A (en) * | 1987-07-30 | 1989-04-25 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and prebaking process |
JPH0362895A (ja) * | 1989-07-31 | 1991-03-18 | Kao Corp | 洗浄剤組成物 |
JPH0397792A (ja) * | 1989-09-11 | 1991-04-23 | Lion Corp | 半田フラックス用液体洗浄剤 |
JPH0457897A (ja) * | 1990-06-27 | 1992-02-25 | Kao Corp | 洗浄剤組成物 |
JPH05179294A (ja) * | 1991-12-26 | 1993-07-20 | Arakawa Chem Ind Co Ltd | 汚染物の洗浄除去剤および汚染物の洗浄除去方法 |
JP2006032483A (ja) * | 2004-07-13 | 2006-02-02 | Seiko Epson Corp | 配線基板の製造方法 |
CN105331452A (zh) * | 2015-11-24 | 2016-02-17 | 桐城信邦电子有限公司 | 一种柔性印刷电路板清洗剂 |
-
1983
- 1983-01-21 JP JP744083A patent/JPS59134891A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824763A (en) * | 1987-07-30 | 1989-04-25 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and prebaking process |
US5399464A (en) * | 1987-07-30 | 1995-03-21 | Ekc Technology, Inc. | Triamine positive photoresist stripping composition and post-ion implantation baking |
JPH0362895A (ja) * | 1989-07-31 | 1991-03-18 | Kao Corp | 洗浄剤組成物 |
JPH0397792A (ja) * | 1989-09-11 | 1991-04-23 | Lion Corp | 半田フラックス用液体洗浄剤 |
JPH0457897A (ja) * | 1990-06-27 | 1992-02-25 | Kao Corp | 洗浄剤組成物 |
JPH05179294A (ja) * | 1991-12-26 | 1993-07-20 | Arakawa Chem Ind Co Ltd | 汚染物の洗浄除去剤および汚染物の洗浄除去方法 |
JP2006032483A (ja) * | 2004-07-13 | 2006-02-02 | Seiko Epson Corp | 配線基板の製造方法 |
CN105331452A (zh) * | 2015-11-24 | 2016-02-17 | 桐城信邦电子有限公司 | 一种柔性印刷电路板清洗剂 |
Also Published As
Publication number | Publication date |
---|---|
JPH0144033B2 (enrdf_load_stackoverflow) | 1989-09-25 |
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