JPS59117725A - 薄膜ヘツドの製造方法 - Google Patents

薄膜ヘツドの製造方法

Info

Publication number
JPS59117725A
JPS59117725A JP23041882A JP23041882A JPS59117725A JP S59117725 A JPS59117725 A JP S59117725A JP 23041882 A JP23041882 A JP 23041882A JP 23041882 A JP23041882 A JP 23041882A JP S59117725 A JPS59117725 A JP S59117725A
Authority
JP
Japan
Prior art keywords
film
insulating film
coil
tapered
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23041882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6248291B2 (OSRAM
Inventor
Keiichi Yanagisawa
佳一 柳沢
Tomoyuki Toshima
戸島　知之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP23041882A priority Critical patent/JPS59117725A/ja
Publication of JPS59117725A publication Critical patent/JPS59117725A/ja
Publication of JPS6248291B2 publication Critical patent/JPS6248291B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
JP23041882A 1982-12-24 1982-12-24 薄膜ヘツドの製造方法 Granted JPS59117725A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23041882A JPS59117725A (ja) 1982-12-24 1982-12-24 薄膜ヘツドの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23041882A JPS59117725A (ja) 1982-12-24 1982-12-24 薄膜ヘツドの製造方法

Publications (2)

Publication Number Publication Date
JPS59117725A true JPS59117725A (ja) 1984-07-07
JPS6248291B2 JPS6248291B2 (OSRAM) 1987-10-13

Family

ID=16907571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23041882A Granted JPS59117725A (ja) 1982-12-24 1982-12-24 薄膜ヘツドの製造方法

Country Status (1)

Country Link
JP (1) JPS59117725A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS626417A (ja) * 1985-07-03 1987-01-13 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法
JPS628321A (ja) * 1985-07-04 1987-01-16 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法
JPS628320A (ja) * 1985-07-04 1987-01-16 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5381110A (en) * 1976-12-25 1978-07-18 Toshiba Corp Manufacture of magnetic film head
JPS5612733A (en) * 1979-07-11 1981-02-07 Fujitsu Ltd Ion etching method
JPS56156915A (en) * 1980-05-06 1981-12-03 Hitachi Ltd Formation of multilayer film for electronic circuit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5381110A (en) * 1976-12-25 1978-07-18 Toshiba Corp Manufacture of magnetic film head
JPS5612733A (en) * 1979-07-11 1981-02-07 Fujitsu Ltd Ion etching method
JPS56156915A (en) * 1980-05-06 1981-12-03 Hitachi Ltd Formation of multilayer film for electronic circuit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS626417A (ja) * 1985-07-03 1987-01-13 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法
JPS628321A (ja) * 1985-07-04 1987-01-16 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法
JPS628320A (ja) * 1985-07-04 1987-01-16 Fuji Photo Film Co Ltd 薄膜磁気ヘツドの製造方法

Also Published As

Publication number Publication date
JPS6248291B2 (OSRAM) 1987-10-13

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