JPS59117120A - ウエハのプリアライメント装置 - Google Patents

ウエハのプリアライメント装置

Info

Publication number
JPS59117120A
JPS59117120A JP57226039A JP22603982A JPS59117120A JP S59117120 A JPS59117120 A JP S59117120A JP 57226039 A JP57226039 A JP 57226039A JP 22603982 A JP22603982 A JP 22603982A JP S59117120 A JPS59117120 A JP S59117120A
Authority
JP
Japan
Prior art keywords
wafer
locus
rotated
orientation flat
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57226039A
Other languages
English (en)
Japanese (ja)
Other versions
JPS635901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Akira Inagaki
晃 稲垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57226039A priority Critical patent/JPS59117120A/ja
Publication of JPS59117120A publication Critical patent/JPS59117120A/ja
Publication of JPS635901B2 publication Critical patent/JPS635901B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57226039A 1982-12-24 1982-12-24 ウエハのプリアライメント装置 Granted JPS59117120A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57226039A JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57226039A JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Publications (2)

Publication Number Publication Date
JPS59117120A true JPS59117120A (ja) 1984-07-06
JPS635901B2 JPS635901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-02-05

Family

ID=16838814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57226039A Granted JPS59117120A (ja) 1982-12-24 1982-12-24 ウエハのプリアライメント装置

Country Status (1)

Country Link
JP (1) JPS59117120A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
CN102971813A (zh) * 2010-07-21 2013-03-13 株式会社神户制钢所 电抗器

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864043A (ja) * 1981-10-13 1983-04-16 Nippon Telegr & Teleph Corp <Ntt> 円板形状体の位置決め装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5864043A (ja) * 1981-10-13 1983-04-16 Nippon Telegr & Teleph Corp <Ntt> 円板形状体の位置決め装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6235640A (ja) * 1985-08-09 1987-02-16 Nec Kyushu Ltd 半導体基板のプリアライメント機構
CN102971813A (zh) * 2010-07-21 2013-03-13 株式会社神户制钢所 电抗器

Also Published As

Publication number Publication date
JPS635901B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-02-05

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