JPS59105323A - 基板上の材料をパタ−ン形成する方法 - Google Patents

基板上の材料をパタ−ン形成する方法

Info

Publication number
JPS59105323A
JPS59105323A JP58219655A JP21965583A JPS59105323A JP S59105323 A JPS59105323 A JP S59105323A JP 58219655 A JP58219655 A JP 58219655A JP 21965583 A JP21965583 A JP 21965583A JP S59105323 A JPS59105323 A JP S59105323A
Authority
JP
Japan
Prior art keywords
radiation
resist
item
forming
conductive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58219655A
Other languages
English (en)
Japanese (ja)
Inventor
ジエラルド・ジヨセフ・ドラン
セオドア・アラン・フルトン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of JPS59105323A publication Critical patent/JPS59105323A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Iron Core Of Rotating Electric Machines (AREA)
JP58219655A 1982-11-24 1983-11-24 基板上の材料をパタ−ン形成する方法 Pending JPS59105323A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US44423882A 1982-11-24 1982-11-24
US444238 1995-04-18

Publications (1)

Publication Number Publication Date
JPS59105323A true JPS59105323A (ja) 1984-06-18

Family

ID=23764056

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58219655A Pending JPS59105323A (ja) 1982-11-24 1983-11-24 基板上の材料をパタ−ン形成する方法

Country Status (6)

Country Link
JP (1) JPS59105323A (nl)
DE (1) DE3342319A1 (nl)
FR (1) FR2536549A1 (nl)
GB (1) GB2132789A (nl)
IT (1) IT1167665B (nl)
NL (1) NL8304031A (nl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4028647C2 (de) * 1989-09-09 1997-02-06 Fraunhofer Ges Forschung Verfahren zum Kopieren von Lochmasken
US7160673B2 (en) * 2002-10-03 2007-01-09 Massachusetts Institute Of Technology System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057105A (en) * 1964-01-23 1967-02-01 Associated Semiconductor Mft An optical mask
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
CH552470A (de) * 1967-08-30 1974-08-15 Pigur Karl August Verfahren zur herstellung einer farbigen reproduktionsmaske.
GB1325442A (en) * 1970-08-21 1973-08-01 Sun Printers Ltd Photomechanical processes
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Also Published As

Publication number Publication date
GB8330864D0 (en) 1983-12-29
DE3342319A1 (de) 1984-05-24
IT8323849A0 (it) 1983-11-23
FR2536549A1 (fr) 1984-05-25
NL8304031A (nl) 1984-06-18
IT8323849A1 (it) 1985-05-23
IT1167665B (it) 1987-05-13
GB2132789A (en) 1984-07-11

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