GB1057105A - An optical mask - Google Patents

An optical mask

Info

Publication number
GB1057105A
GB1057105A GB297364A GB297364A GB1057105A GB 1057105 A GB1057105 A GB 1057105A GB 297364 A GB297364 A GB 297364A GB 297364 A GB297364 A GB 297364A GB 1057105 A GB1057105 A GB 1057105A
Authority
GB
United Kingdom
Prior art keywords
chromium
etchant
etching
glass
optical mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB297364A
Inventor
David Thomas Lewis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASSOCIATED SEMICONDUCTOR MFT
Original Assignee
ASSOCIATED SEMICONDUCTOR MFT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASSOCIATED SEMICONDUCTOR MFT filed Critical ASSOCIATED SEMICONDUCTOR MFT
Priority to GB297364A priority Critical patent/GB1057105A/en
Priority to DE19651521902 priority patent/DE1521902A1/en
Priority to NL6500630A priority patent/NL142998B/en
Priority to AT42465A priority patent/AT261712B/en
Priority to SE73865A priority patent/SE336957B/xx
Priority to JP261665A priority patent/JPS5021227B1/ja
Priority to CH81165A priority patent/CH464693A/en
Priority to BE658730A priority patent/BE658730A/xx
Priority to FR3026A priority patent/FR1421953A/en
Publication of GB1057105A publication Critical patent/GB1057105A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

An optical mask is produced by vapour depositing chromium on to a transparent substrate such as glass, masking part of the chromium with an etch resistant mask and etching the exposed chromium. The etch resistant mask is applied by a photo-lithographic technique and the etchant may be fuming HCl or a solution of HCl or H2SO4. The etching may be initiated by scratching the exposed chromium or by adding zinc or nickel to the etchant. The glass is heated prior to deposition of the chromium which forms a layer 1000A thick.
GB297364A 1964-01-23 1964-01-23 An optical mask Expired GB1057105A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
GB297364A GB1057105A (en) 1964-01-23 1964-01-23 An optical mask
DE19651521902 DE1521902A1 (en) 1964-01-23 1965-01-19 Method of making an optical mask
NL6500630A NL142998B (en) 1964-01-23 1965-01-19 PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICE MANUFACTURED BY THE PROCESS.
AT42465A AT261712B (en) 1964-01-23 1965-01-20 Method of making an optical mask
SE73865A SE336957B (en) 1964-01-23 1965-01-20
JP261665A JPS5021227B1 (en) 1964-01-23 1965-01-20
CH81165A CH464693A (en) 1964-01-23 1965-01-20 Method of making an optical mask
BE658730A BE658730A (en) 1964-01-23 1965-01-22
FR3026A FR1421953A (en) 1964-01-23 1965-01-22 Optical mask to produce objects photomechanically

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB297364A GB1057105A (en) 1964-01-23 1964-01-23 An optical mask

Publications (1)

Publication Number Publication Date
GB1057105A true GB1057105A (en) 1967-02-01

Family

ID=9749528

Family Applications (1)

Application Number Title Priority Date Filing Date
GB297364A Expired GB1057105A (en) 1964-01-23 1964-01-23 An optical mask

Country Status (9)

Country Link
JP (1) JPS5021227B1 (en)
AT (1) AT261712B (en)
BE (1) BE658730A (en)
CH (1) CH464693A (en)
DE (1) DE1521902A1 (en)
FR (1) FR1421953A (en)
GB (1) GB1057105A (en)
NL (1) NL142998B (en)
SE (1) SE336957B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2536549A1 (en) * 1982-11-24 1984-05-25 Western Electric Co METHOD FOR FORMING A PATTERN IN MATERIAL ON A SUBSTRATE

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215410A1 (en) * 1982-04-24 1983-10-27 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Method of using a mask to produce openings in a layer on a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2536549A1 (en) * 1982-11-24 1984-05-25 Western Electric Co METHOD FOR FORMING A PATTERN IN MATERIAL ON A SUBSTRATE

Also Published As

Publication number Publication date
NL142998B (en) 1974-08-15
DE1521902A1 (en) 1969-05-29
SE336957B (en) 1971-07-19
AT261712B (en) 1968-05-10
FR1421953A (en) 1965-12-17
CH464693A (en) 1968-10-31
JPS5021227B1 (en) 1975-07-21
NL6500630A (en) 1965-07-26
BE658730A (en) 1965-07-22

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