GB1057105A - An optical mask - Google Patents

An optical mask

Info

Publication number
GB1057105A
GB1057105A GB297364A GB297364A GB1057105A GB 1057105 A GB1057105 A GB 1057105A GB 297364 A GB297364 A GB 297364A GB 297364 A GB297364 A GB 297364A GB 1057105 A GB1057105 A GB 1057105A
Authority
GB
United Kingdom
Prior art keywords
chromium
etchant
etching
glass
optical mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB297364A
Inventor
David Thomas Lewis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASSOCIATED SEMICONDUCTOR MFT
Original Assignee
ASSOCIATED SEMICONDUCTOR MFT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASSOCIATED SEMICONDUCTOR MFT filed Critical ASSOCIATED SEMICONDUCTOR MFT
Priority to GB297364A priority Critical patent/GB1057105A/en
Priority to NL6500630A priority patent/NL142998B/en
Priority to DE19651521902 priority patent/DE1521902A1/en
Priority to JP261665A priority patent/JPS5021227B1/ja
Priority to SE73865A priority patent/SE336957B/xx
Priority to CH81165A priority patent/CH464693A/en
Priority to AT42465A priority patent/AT261712B/en
Priority to FR3026A priority patent/FR1421953A/en
Priority to BE658730A priority patent/BE658730A/xx
Publication of GB1057105A publication Critical patent/GB1057105A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An optical mask is produced by vapour depositing chromium on to a transparent substrate such as glass, masking part of the chromium with an etch resistant mask and etching the exposed chromium. The etch resistant mask is applied by a photo-lithographic technique and the etchant may be fuming HCl or a solution of HCl or H2SO4. The etching may be initiated by scratching the exposed chromium or by adding zinc or nickel to the etchant. The glass is heated prior to deposition of the chromium which forms a layer 1000A thick.
GB297364A 1964-01-23 1964-01-23 An optical mask Expired GB1057105A (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
GB297364A GB1057105A (en) 1964-01-23 1964-01-23 An optical mask
NL6500630A NL142998B (en) 1964-01-23 1965-01-19 PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICE MANUFACTURED BY THE PROCESS.
DE19651521902 DE1521902A1 (en) 1964-01-23 1965-01-19 Method of making an optical mask
JP261665A JPS5021227B1 (en) 1964-01-23 1965-01-20
SE73865A SE336957B (en) 1964-01-23 1965-01-20
CH81165A CH464693A (en) 1964-01-23 1965-01-20 Method of making an optical mask
AT42465A AT261712B (en) 1964-01-23 1965-01-20 Method of making an optical mask
FR3026A FR1421953A (en) 1964-01-23 1965-01-22 Optical mask to produce objects photomechanically
BE658730A BE658730A (en) 1964-01-23 1965-01-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB297364A GB1057105A (en) 1964-01-23 1964-01-23 An optical mask

Publications (1)

Publication Number Publication Date
GB1057105A true GB1057105A (en) 1967-02-01

Family

ID=9749528

Family Applications (1)

Application Number Title Priority Date Filing Date
GB297364A Expired GB1057105A (en) 1964-01-23 1964-01-23 An optical mask

Country Status (9)

Country Link
JP (1) JPS5021227B1 (en)
AT (1) AT261712B (en)
BE (1) BE658730A (en)
CH (1) CH464693A (en)
DE (1) DE1521902A1 (en)
FR (1) FR1421953A (en)
GB (1) GB1057105A (en)
NL (1) NL142998B (en)
SE (1) SE336957B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2536549A1 (en) * 1982-11-24 1984-05-25 Western Electric Co METHOD FOR FORMING A PATTERN IN MATERIAL ON A SUBSTRATE

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3215410A1 (en) * 1982-04-24 1983-10-27 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Method of using a mask to produce openings in a layer on a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2536549A1 (en) * 1982-11-24 1984-05-25 Western Electric Co METHOD FOR FORMING A PATTERN IN MATERIAL ON A SUBSTRATE

Also Published As

Publication number Publication date
BE658730A (en) 1965-07-22
FR1421953A (en) 1965-12-17
NL142998B (en) 1974-08-15
DE1521902A1 (en) 1969-05-29
SE336957B (en) 1971-07-19
NL6500630A (en) 1965-07-26
JPS5021227B1 (en) 1975-07-21
AT261712B (en) 1968-05-10
CH464693A (en) 1968-10-31

Similar Documents

Publication Publication Date Title
ES357158A1 (en) Methods of etching chromium patterns and photolithographic masks so produced
BR6465104D0 (en) PROCESS OF FORMING A CONVERSATION COATING ON FERRIFEN METAL SURFACES WITH AUTOMATIC CONTROL OF NITRITE ADDITION IN ACID Phosphate SOLUTIONS
GB1057105A (en) An optical mask
GB1072994A (en) Improvements in and relating to the treatment of photosensitised layers
JPS5569142A (en) Preventing method for peeling of resist
NL6814882A (en)
ES356908A1 (en) Photolithographic masks and methods for their manufacture
JPS5432143A (en) Etching process
GB998199A (en) Improvements in or relating to the manufacture of semiconductor devices
GB1103388A (en) Thermoelectric batteries
GB1031978A (en) Improvements in or relating to photolithographic masks
JPS57147634A (en) Photomask blank
GB1163463A (en) A Process for the Production of Metal Coating Connections in a Semiconductor System
JPS5588057A (en) Production of photo mask
GB1220368A (en) Improvements in photolytic etching of silicon dioxide
JPS57185405A (en) Production of optical waveguide
JPS5284760A (en) Formation of electrode for liquid crystal display element
NO162009C (en) CASTLE APPLIANCE FOR THE MANUFACTURING OF LENSES OR OTHER OPTICAL DEVICES.
GB1209380A (en) Image plane plate
JPS5282442A (en) Glass electode substrate for liquid crystal display unit
JPS55118653A (en) Semiconductor device
JPS5619623A (en) Photomask
DK113731B (en) Roofing sheet composed of a substrate and an outer layer attached thereto, as well as a method of manufacturing such a roofing sheet.
JPS5472697A (en) Manufacture for elastic surface wave element
ES10544U (en) A siphon with metallic ornaments (Machine-translation by Google Translate, not legally binding)