IT8323849A0 - Procedimento per la generazione di disegni. - Google Patents

Procedimento per la generazione di disegni.

Info

Publication number
IT8323849A0
IT8323849A0 IT8323849A IT2384983A IT8323849A0 IT 8323849 A0 IT8323849 A0 IT 8323849A0 IT 8323849 A IT8323849 A IT 8323849A IT 2384983 A IT2384983 A IT 2384983A IT 8323849 A0 IT8323849 A0 IT 8323849A0
Authority
IT
Italy
Prior art keywords
procedure
generation
drawings
Prior art date
Application number
IT8323849A
Other languages
English (en)
Other versions
IT8323849A1 (it
IT1167665B (it
Inventor
Gerald Joseph Dolan
Theodore Alan Fulton
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of IT8323849A0 publication Critical patent/IT8323849A0/it
Publication of IT8323849A1 publication Critical patent/IT8323849A1/it
Application granted granted Critical
Publication of IT1167665B publication Critical patent/IT1167665B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Iron Core Of Rotating Electric Machines (AREA)
IT23849/83A 1982-11-24 1983-11-23 Procedimento per la generazione di disegni IT1167665B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US44423882A 1982-11-24 1982-11-24

Publications (3)

Publication Number Publication Date
IT8323849A0 true IT8323849A0 (it) 1983-11-23
IT8323849A1 IT8323849A1 (it) 1985-05-23
IT1167665B IT1167665B (it) 1987-05-13

Family

ID=23764056

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23849/83A IT1167665B (it) 1982-11-24 1983-11-23 Procedimento per la generazione di disegni

Country Status (6)

Country Link
JP (1) JPS59105323A (it)
DE (1) DE3342319A1 (it)
FR (1) FR2536549A1 (it)
GB (1) GB2132789A (it)
IT (1) IT1167665B (it)
NL (1) NL8304031A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4028647C2 (de) * 1989-09-09 1997-02-06 Fraunhofer Ges Forschung Verfahren zum Kopieren von Lochmasken
WO2004031861A2 (en) * 2002-10-03 2004-04-15 Massachusetts Institute Of Technology Method for fabrication of diffractive optical elements for maskless lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1057105A (en) * 1964-01-23 1967-02-01 Associated Semiconductor Mft An optical mask
US3539408A (en) * 1967-08-11 1970-11-10 Western Electric Co Methods of etching chromium patterns and photolithographic masks so produced
CH552470A (de) * 1967-08-30 1974-08-15 Pigur Karl August Verfahren zur herstellung einer farbigen reproduktionsmaske.
GB1325442A (en) * 1970-08-21 1973-08-01 Sun Printers Ltd Photomechanical processes
GB1530978A (en) * 1976-05-10 1978-11-01 Rca Corp Method for removing material from a substrate
DE2721687C2 (de) * 1977-05-13 1986-11-20 Hoechst Ag, 6230 Frankfurt Verfahren zum Abdecken von Kopiervorlagen mit Masken
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料

Also Published As

Publication number Publication date
IT8323849A1 (it) 1985-05-23
IT1167665B (it) 1987-05-13
GB8330864D0 (en) 1983-12-29
FR2536549A1 (fr) 1984-05-25
JPS59105323A (ja) 1984-06-18
GB2132789A (en) 1984-07-11
DE3342319A1 (de) 1984-05-24
NL8304031A (nl) 1984-06-18

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