JPS5898938A - 半導体集積回路 - Google Patents

半導体集積回路

Info

Publication number
JPS5898938A
JPS5898938A JP56197828A JP19782881A JPS5898938A JP S5898938 A JPS5898938 A JP S5898938A JP 56197828 A JP56197828 A JP 56197828A JP 19782881 A JP19782881 A JP 19782881A JP S5898938 A JPS5898938 A JP S5898938A
Authority
JP
Japan
Prior art keywords
pad
semiconductor integrated
integrated circuit
insulator
distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56197828A
Other languages
English (en)
Inventor
Yasushi Kawakami
靖 川上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56197828A priority Critical patent/JPS5898938A/ja
Publication of JPS5898938A publication Critical patent/JPS5898938A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Wire Bonding (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 本発明は、特に半導体集積回路装置におけるポンディン
グパッド部の構造に関する。
最近、半導体集積回路は、益々その集積度を増している
が、ボンディング用のパッドの大きさ、ノくラド間隔、
パッドと内部素子との距離が、半導体集積回路のチーノ
ブサイズに大きな影響をおよぼしている。
本発明は、パッドの面からチップナイズの縮少化につな
がる方法を提供するものである。
以下、図面により本発明の詳細な説明する。
第1図は、通常の半導体集積回動の部分平面図であり、
lはシリコン基板、2は金属パッド、3は内部素子が形
成査れる境界又は内部配線、4はパッドから内部素子ま
での距離を示す。このパ。
ド2と内部素子3までの距離は一定間隔離さねばならな
い。そこで、本発明はこの距離をより短くするものであ
る。すなわち、第2,3図のようにパッドを二重構造に
することで、内部素子とパッド5の距離を最少にするこ
とが可能である。第3図の5を第1パツド、21を第2
パツドとすると、絶縁物カバーの形成時に、第1パツド
5の上に穴があくように絶縁物6でカバーし、次に第2
パ。
ドな蒸着させて再び絶縁物6でカバーする。このようK
することで、第1パツド5と内部素子3との距離7を最
小で設計できるため、集積度な上げることが可能である
。また、ボンディングに必要な面積はパッド2′で得て
いる。第3図かられかるようにパッド21と素子3との
距離は平面的にみてほとんどない。
このように内部素子との入出力を行うパッドと外部との
接続を行うパッドを有する構造のものはすべて含まれる
【図面の簡単な説明】
第1図は、従来の半導体集積回路のチップの部分平面図
であり、第2図は、本発明の一実施例の部分平面図であ
り、第3図は第2図の断面図である。

Claims (1)

    【特許請求の範囲】
  1. 半導体装置のボンディング用のパッドにおいて内部素子
    との入出力をやりとりするパッドと、ボンディング用の
    パッドを有し二重構造を成す半導体集積回動。
JP56197828A 1981-12-09 1981-12-09 半導体集積回路 Pending JPS5898938A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56197828A JPS5898938A (ja) 1981-12-09 1981-12-09 半導体集積回路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56197828A JPS5898938A (ja) 1981-12-09 1981-12-09 半導体集積回路

Publications (1)

Publication Number Publication Date
JPS5898938A true JPS5898938A (ja) 1983-06-13

Family

ID=16381010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56197828A Pending JPS5898938A (ja) 1981-12-09 1981-12-09 半導体集積回路

Country Status (1)

Country Link
JP (1) JPS5898938A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4688070A (en) * 1983-05-24 1987-08-18 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device
EP0693782A1 (en) * 1994-07-13 1996-01-24 United Microelectronics Corporation Method for reducing process antenna effect
US5891745A (en) * 1994-10-28 1999-04-06 Honeywell Inc. Test and tear-away bond pad design

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4688070A (en) * 1983-05-24 1987-08-18 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device
EP0693782A1 (en) * 1994-07-13 1996-01-24 United Microelectronics Corporation Method for reducing process antenna effect
US5891745A (en) * 1994-10-28 1999-04-06 Honeywell Inc. Test and tear-away bond pad design

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