JPS5892235A - 集積回路素子の製造方法 - Google Patents
集積回路素子の製造方法Info
- Publication number
- JPS5892235A JPS5892235A JP19115281A JP19115281A JPS5892235A JP S5892235 A JPS5892235 A JP S5892235A JP 19115281 A JP19115281 A JP 19115281A JP 19115281 A JP19115281 A JP 19115281A JP S5892235 A JPS5892235 A JP S5892235A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- metal wiring
- insulating film
- semiconductor substrate
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19115281A JPS5892235A (ja) | 1981-11-27 | 1981-11-27 | 集積回路素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19115281A JPS5892235A (ja) | 1981-11-27 | 1981-11-27 | 集積回路素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5892235A true JPS5892235A (ja) | 1983-06-01 |
| JPS6246064B2 JPS6246064B2 (enrdf_load_stackoverflow) | 1987-09-30 |
Family
ID=16269759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19115281A Granted JPS5892235A (ja) | 1981-11-27 | 1981-11-27 | 集積回路素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5892235A (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5526619A (en) * | 1978-08-15 | 1980-02-26 | Toshiba Corp | Method of producing semiconductor device |
-
1981
- 1981-11-27 JP JP19115281A patent/JPS5892235A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5526619A (en) * | 1978-08-15 | 1980-02-26 | Toshiba Corp | Method of producing semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6246064B2 (enrdf_load_stackoverflow) | 1987-09-30 |
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