JPS5880872A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS5880872A JPS5880872A JP56178287A JP17828781A JPS5880872A JP S5880872 A JPS5880872 A JP S5880872A JP 56178287 A JP56178287 A JP 56178287A JP 17828781 A JP17828781 A JP 17828781A JP S5880872 A JPS5880872 A JP S5880872A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- ohmic contact
- electrode
- alloy
- conductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56178287A JPS5880872A (ja) | 1981-11-09 | 1981-11-09 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56178287A JPS5880872A (ja) | 1981-11-09 | 1981-11-09 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5880872A true JPS5880872A (ja) | 1983-05-16 |
| JPS6211793B2 JPS6211793B2 (cs) | 1987-03-14 |
Family
ID=16045824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56178287A Granted JPS5880872A (ja) | 1981-11-09 | 1981-11-09 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5880872A (cs) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60120560A (ja) * | 1983-12-05 | 1985-06-28 | Fujitsu Ltd | 半導体装置 |
| JPS60242619A (ja) * | 1984-05-16 | 1985-12-02 | Nippon Telegr & Teleph Corp <Ntt> | 半導体オ−ム性電極の形成方法 |
| JPS6360526A (ja) * | 1986-08-30 | 1988-03-16 | Sharp Corp | 半導体装置の製造方法 |
| KR20140135786A (ko) * | 2012-02-24 | 2014-11-26 | 스카이워크스 솔루션즈, 인코포레이티드 | 화합물 반도체용 구리 상호접속부에 관련된 개선된 구조체, 소자 및 방법 |
-
1981
- 1981-11-09 JP JP56178287A patent/JPS5880872A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60120560A (ja) * | 1983-12-05 | 1985-06-28 | Fujitsu Ltd | 半導体装置 |
| JPS60242619A (ja) * | 1984-05-16 | 1985-12-02 | Nippon Telegr & Teleph Corp <Ntt> | 半導体オ−ム性電極の形成方法 |
| JPS6360526A (ja) * | 1986-08-30 | 1988-03-16 | Sharp Corp | 半導体装置の製造方法 |
| KR20140135786A (ko) * | 2012-02-24 | 2014-11-26 | 스카이워크스 솔루션즈, 인코포레이티드 | 화합물 반도체용 구리 상호접속부에 관련된 개선된 구조체, 소자 및 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6211793B2 (cs) | 1987-03-14 |
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