JPS5846680A - 記憶素子 - Google Patents
記憶素子Info
- Publication number
- JPS5846680A JPS5846680A JP56145328A JP14532881A JPS5846680A JP S5846680 A JPS5846680 A JP S5846680A JP 56145328 A JP56145328 A JP 56145328A JP 14532881 A JP14532881 A JP 14532881A JP S5846680 A JPS5846680 A JP S5846680A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- electrode
- semiconductor
- memory element
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56145328A JPS5846680A (ja) | 1981-09-14 | 1981-09-14 | 記憶素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56145328A JPS5846680A (ja) | 1981-09-14 | 1981-09-14 | 記憶素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5846680A true JPS5846680A (ja) | 1983-03-18 |
JPH0145750B2 JPH0145750B2 (enrdf_load_stackoverflow) | 1989-10-04 |
Family
ID=15382619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56145328A Granted JPS5846680A (ja) | 1981-09-14 | 1981-09-14 | 記憶素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5846680A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02239652A (ja) * | 1989-03-14 | 1990-09-21 | Toshiba Corp | 半導体装置 |
WO1996029742A1 (en) * | 1995-03-17 | 1996-09-26 | Radiant Technologies, Inc. | Improved non-destructively read ferroelectric memory cell |
US5955213A (en) * | 1995-08-25 | 1999-09-21 | Tdk Corporation | Ferroelectric thin film, electric device, and method for preparing ferroelectric thin film |
WO2003058723A1 (fr) * | 2001-12-28 | 2003-07-17 | National Institute Of Advanced Industrial Science And Technology | Transistor a film mince organique et son procede de fabrication |
-
1981
- 1981-09-14 JP JP56145328A patent/JPS5846680A/ja active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02239652A (ja) * | 1989-03-14 | 1990-09-21 | Toshiba Corp | 半導体装置 |
US5521417A (en) * | 1989-03-14 | 1996-05-28 | Kabushiki Kaisha Toshiba | Semiconductor device comprising a non-volatile memory formed on a data processor |
WO1996029742A1 (en) * | 1995-03-17 | 1996-09-26 | Radiant Technologies, Inc. | Improved non-destructively read ferroelectric memory cell |
US5578846A (en) * | 1995-03-17 | 1996-11-26 | Evans, Jr.; Joseph T. | Static ferroelectric memory transistor having improved data retention |
EP0815596A4 (en) * | 1995-03-17 | 1998-06-03 | Radiant Technologies Inc | IMPROVED NON-DESTRUCTIVE FERROELECTRIC MEMORY CELL |
US6225654B1 (en) * | 1995-03-17 | 2001-05-01 | Radiant Technologies, Inc | Static ferrolectric memory transistor having improved data retention |
US5955213A (en) * | 1995-08-25 | 1999-09-21 | Tdk Corporation | Ferroelectric thin film, electric device, and method for preparing ferroelectric thin film |
WO2003058723A1 (fr) * | 2001-12-28 | 2003-07-17 | National Institute Of Advanced Industrial Science And Technology | Transistor a film mince organique et son procede de fabrication |
US7138682B2 (en) | 2001-12-28 | 2006-11-21 | National Institute Of Advanced Industrial Science And Technology | Organic thin-film transistor and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0145750B2 (enrdf_load_stackoverflow) | 1989-10-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3460095B2 (ja) | 強誘電体メモリ | |
US3636530A (en) | Nonvolatile direct storage bistable circuit | |
RU2184400C2 (ru) | Сегнетоэлектрическое устройство обработки данных | |
CN102171766B (zh) | 包含压电应力材料的自旋力矩转移磁性随机存取存储器单元结构 | |
JP5648940B2 (ja) | 磁気トンネル接合において磁界を制御するための装置、方法、メモリ・セル | |
JP3239109B2 (ja) | 強誘電体不揮発性メモリとその読み出し方法 | |
JP4603437B2 (ja) | 相補出力型抵抗性メモリセル | |
CN107230676A (zh) | 高读出电流的非挥发铁电存储器及其操作方法 | |
US3997885A (en) | Register for the propagation of magnetic domains in thin magnetic layers | |
JP3089671B2 (ja) | 半導体記憶装置 | |
CN108389962A (zh) | 面内读写的铁电阻变存储器及其增强读/写信号的方法 | |
KR970076815A (ko) | 단일 전자 메모리 셀 장치 | |
CN108520879B (zh) | 一种高密度铁电存储器单元 | |
JPS5846680A (ja) | 記憶素子 | |
CN108550551B (zh) | 基于畴壁密度来存储数据的非破坏读取铁电多逻辑态存储单元及写/读/擦除操作方法 | |
CN207398179U (zh) | 一种磁电存储器存储单元结构 | |
JP4042351B2 (ja) | 記憶装置 | |
JP3131340B2 (ja) | 強誘電体記憶素子 | |
JP2818068B2 (ja) | 強誘電体を用いた書換え可能な不揮発性多値メモリ | |
US20220045267A1 (en) | Magnetoresistive element having a sidewall-current-channel structure | |
JPS58118090A (ja) | 記憶装置 | |
JPH03108770A (ja) | 強誘電体メモリ | |
RU2075786C1 (ru) | Элемент памяти | |
JP3024995B2 (ja) | Mim構造半導体メモリ | |
JP2586174B2 (ja) | 記憶装置 |