JPS5842472A - サ−マルヘツド - Google Patents
サ−マルヘツドInfo
- Publication number
- JPS5842472A JPS5842472A JP56140653A JP14065381A JPS5842472A JP S5842472 A JPS5842472 A JP S5842472A JP 56140653 A JP56140653 A JP 56140653A JP 14065381 A JP14065381 A JP 14065381A JP S5842472 A JPS5842472 A JP S5842472A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- thermal head
- wear
- plasma
- heating element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 34
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 14
- 239000007789 gas Substances 0.000 abstract description 10
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 abstract description 6
- 229930195733 hydrocarbon Natural products 0.000 abstract description 4
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 4
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 abstract description 3
- 239000005977 Ethylene Substances 0.000 abstract description 3
- 239000001294 propane Substances 0.000 abstract description 3
- 238000010891 electric arc Methods 0.000 abstract description 2
- 239000007792 gaseous phase Substances 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- -1 ethylene ( 0 Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 2
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 206010010904 Convulsion Diseases 0.000 description 1
- 241000775881 Haematopota pluvialis Species 0.000 description 1
- YQEZLKZALYSWHR-UHFFFAOYSA-N Ketamine Chemical compound C=1C=CC=C(Cl)C=1C1(NC)CCCCC1=O YQEZLKZALYSWHR-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000036461 convulsion Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- VCZQFJFZMMALHB-UHFFFAOYSA-N tetraethylsilane Chemical compound CC[Si](CC)(CC)CC VCZQFJFZMMALHB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Adjustable Resistors (AREA)
- Electronic Switches (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56140653A JPS5842472A (ja) | 1981-09-07 | 1981-09-07 | サ−マルヘツド |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56140653A JPS5842472A (ja) | 1981-09-07 | 1981-09-07 | サ−マルヘツド |
Related Child Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62229383A Division JPS6378761A (ja) | 1987-09-12 | 1987-09-12 | サーマルヘッド作成方法 |
| JP22938587A Division JPS63145776A (ja) | 1987-09-12 | 1987-09-12 | 被膜作成方法 |
| JP22938687A Division JPS6379972A (ja) | 1987-09-12 | 1987-09-12 | 炭素被膜 |
| JP62229384A Division JPS6372559A (ja) | 1987-09-12 | 1987-09-12 | サーマルヘッド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5842472A true JPS5842472A (ja) | 1983-03-11 |
| JPS6153955B2 JPS6153955B2 (enrdf_load_stackoverflow) | 1986-11-20 |
Family
ID=15273645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56140653A Granted JPS5842472A (ja) | 1981-09-07 | 1981-09-07 | サ−マルヘツド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5842472A (enrdf_load_stackoverflow) |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59195365A (ja) * | 1983-04-19 | 1984-11-06 | Kao Corp | 記録媒体の摺接部品 |
| JPS61189957A (ja) * | 1985-02-19 | 1986-08-23 | Matsushita Electric Ind Co Ltd | サ−マルヘツド |
| JPS634068A (ja) * | 1986-06-23 | 1988-01-09 | Nec Corp | ダイヤモンド状カ−ボン膜 |
| US4783369A (en) * | 1985-03-23 | 1988-11-08 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
| US4804974A (en) * | 1985-03-23 | 1989-02-14 | Canon Kabushiki Kaisha | Thermal recording head |
| JPH01132779A (ja) * | 1987-11-17 | 1989-05-25 | Nikon Corp | 硬質炭素膜被覆を施した金属基体 |
| US4845513A (en) * | 1985-03-23 | 1989-07-04 | Canon Kabushiki Kaisha | Thermal recording head |
| US4847639A (en) * | 1985-06-10 | 1989-07-11 | Canon Kabushiki Kaisha | Liquid jet recording head and recording system incorporating the same |
| US4870388A (en) * | 1985-03-22 | 1989-09-26 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
| JPH021339A (ja) * | 1988-03-28 | 1990-01-05 | Toshiba Corp | 耐熱性絶縁基板、サーマルヘッドおよび感熱記録装置 |
| JPH02238957A (ja) * | 1990-01-26 | 1990-09-21 | Semiconductor Energy Lab Co Ltd | サーマルヘッド |
| US4983993A (en) * | 1985-03-25 | 1991-01-08 | Canon Kabushiki Kaisha | Thermal recording head |
| JPH0656145U (ja) * | 1992-12-28 | 1994-08-05 | 住金鋼材工業株式会社 | 切り梁ジャッキ |
| US6165582A (en) * | 1992-11-19 | 2000-12-26 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US6171674B1 (en) * | 1993-07-20 | 2001-01-09 | Semiconductor Energy Laboratory Co., Ltd. | Hard carbon coating for magnetic recording medium |
| US6256052B1 (en) | 1998-07-21 | 2001-07-03 | Fuji Photo Film Co., Ltd. | Thermal head |
| US6748959B1 (en) | 1999-03-26 | 2004-06-15 | Fuji Photo Film., Ltd. | Carbon layer forming method |
| US6805941B1 (en) | 1992-11-19 | 2004-10-19 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US6835523B1 (en) | 1993-05-09 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for fabricating coating and method of fabricating the coating |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63289975A (ja) * | 1987-05-22 | 1988-11-28 | Ckd Corp | 圧電アクチュエ−タ |
| JP2002079522A (ja) * | 2000-06-23 | 2002-03-19 | Hitachi Maxell Ltd | ディスク基板成形金型及び樹脂成形金型 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143841A (en) * | 1976-05-26 | 1977-11-30 | Matsushita Electric Ind Co Ltd | Thin film type thermal head |
| JPS5325442A (en) * | 1976-08-20 | 1978-03-09 | Matsushita Electric Ind Co Ltd | Thermal print head |
| JPS5390943A (en) * | 1977-01-20 | 1978-08-10 | Tdk Corp | Printing head of heat sesitive system |
| JPS5476242A (en) * | 1977-11-30 | 1979-06-18 | Namiki Precision Jewel Co Ltd | Thermal head |
| JPS5492270A (en) * | 1977-12-28 | 1979-07-21 | Canon Inc | Thermal head |
-
1981
- 1981-09-07 JP JP56140653A patent/JPS5842472A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52143841A (en) * | 1976-05-26 | 1977-11-30 | Matsushita Electric Ind Co Ltd | Thin film type thermal head |
| JPS5325442A (en) * | 1976-08-20 | 1978-03-09 | Matsushita Electric Ind Co Ltd | Thermal print head |
| JPS5390943A (en) * | 1977-01-20 | 1978-08-10 | Tdk Corp | Printing head of heat sesitive system |
| JPS5476242A (en) * | 1977-11-30 | 1979-06-18 | Namiki Precision Jewel Co Ltd | Thermal head |
| JPS5492270A (en) * | 1977-12-28 | 1979-07-21 | Canon Inc | Thermal head |
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59195365A (ja) * | 1983-04-19 | 1984-11-06 | Kao Corp | 記録媒体の摺接部品 |
| JPS61189957A (ja) * | 1985-02-19 | 1986-08-23 | Matsushita Electric Ind Co Ltd | サ−マルヘツド |
| US4870388A (en) * | 1985-03-22 | 1989-09-26 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
| US4804974A (en) * | 1985-03-23 | 1989-02-14 | Canon Kabushiki Kaisha | Thermal recording head |
| US4783369A (en) * | 1985-03-23 | 1988-11-08 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
| US4845513A (en) * | 1985-03-23 | 1989-07-04 | Canon Kabushiki Kaisha | Thermal recording head |
| US4983993A (en) * | 1985-03-25 | 1991-01-08 | Canon Kabushiki Kaisha | Thermal recording head |
| US4847639A (en) * | 1985-06-10 | 1989-07-11 | Canon Kabushiki Kaisha | Liquid jet recording head and recording system incorporating the same |
| JPS634068A (ja) * | 1986-06-23 | 1988-01-09 | Nec Corp | ダイヤモンド状カ−ボン膜 |
| JPH01132779A (ja) * | 1987-11-17 | 1989-05-25 | Nikon Corp | 硬質炭素膜被覆を施した金属基体 |
| JPH021339A (ja) * | 1988-03-28 | 1990-01-05 | Toshiba Corp | 耐熱性絶縁基板、サーマルヘッドおよび感熱記録装置 |
| JPH02238957A (ja) * | 1990-01-26 | 1990-09-21 | Semiconductor Energy Lab Co Ltd | サーマルヘッド |
| US6623836B1 (en) | 1992-11-19 | 2003-09-23 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US6165582A (en) * | 1992-11-19 | 2000-12-26 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US7391592B2 (en) | 1992-11-19 | 2008-06-24 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium including a diamond-like carbon protective film and at least two additional elements |
| US7083873B2 (en) | 1992-11-19 | 2006-08-01 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium including a diamond-like carbon protective film with hydrogen and at least two additional elements |
| US6194047B1 (en) * | 1992-11-19 | 2001-02-27 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| US6805941B1 (en) | 1992-11-19 | 2004-10-19 | Semiconductor Energy Laboratory Co., Ltd. | Magnetic recording medium |
| JPH0656145U (ja) * | 1992-12-28 | 1994-08-05 | 住金鋼材工業株式会社 | 切り梁ジャッキ |
| US6835523B1 (en) | 1993-05-09 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for fabricating coating and method of fabricating the coating |
| US6468617B1 (en) | 1993-07-20 | 2002-10-22 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for fabricating coating and method of fabricating the coating |
| US6183816B1 (en) | 1993-07-20 | 2001-02-06 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating the coating |
| US6171674B1 (en) * | 1993-07-20 | 2001-01-09 | Semiconductor Energy Laboratory Co., Ltd. | Hard carbon coating for magnetic recording medium |
| US7700164B2 (en) | 1993-07-20 | 2010-04-20 | Semiconductor Energy Laboratory Co., Ltd | Apparatus for fabricating coating and method of fabricating the coating |
| US6256052B1 (en) | 1998-07-21 | 2001-07-03 | Fuji Photo Film Co., Ltd. | Thermal head |
| US6748959B1 (en) | 1999-03-26 | 2004-06-15 | Fuji Photo Film., Ltd. | Carbon layer forming method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6153955B2 (enrdf_load_stackoverflow) | 1986-11-20 |
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