JPS5824437Y2 - 半導体熱処理容器 - Google Patents

半導体熱処理容器

Info

Publication number
JPS5824437Y2
JPS5824437Y2 JP1979022555U JP2255579U JPS5824437Y2 JP S5824437 Y2 JPS5824437 Y2 JP S5824437Y2 JP 1979022555 U JP1979022555 U JP 1979022555U JP 2255579 U JP2255579 U JP 2255579U JP S5824437 Y2 JPS5824437 Y2 JP S5824437Y2
Authority
JP
Japan
Prior art keywords
heat treatment
treatment container
diffusion
semiconductor
semiconductor substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979022555U
Other languages
English (en)
Japanese (ja)
Other versions
JPS55124847U (enrdf_load_stackoverflow
Inventor
春夫 下田
好史 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1979022555U priority Critical patent/JPS5824437Y2/ja
Publication of JPS55124847U publication Critical patent/JPS55124847U/ja
Application granted granted Critical
Publication of JPS5824437Y2 publication Critical patent/JPS5824437Y2/ja
Expired legal-status Critical Current

Links

JP1979022555U 1979-02-23 1979-02-23 半導体熱処理容器 Expired JPS5824437Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979022555U JPS5824437Y2 (ja) 1979-02-23 1979-02-23 半導体熱処理容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979022555U JPS5824437Y2 (ja) 1979-02-23 1979-02-23 半導体熱処理容器

Publications (2)

Publication Number Publication Date
JPS55124847U JPS55124847U (enrdf_load_stackoverflow) 1980-09-04
JPS5824437Y2 true JPS5824437Y2 (ja) 1983-05-25

Family

ID=28857533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979022555U Expired JPS5824437Y2 (ja) 1979-02-23 1979-02-23 半導体熱処理容器

Country Status (1)

Country Link
JP (1) JPS5824437Y2 (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5080757A (enrdf_load_stackoverflow) * 1973-11-14 1975-07-01
JPS5521344Y2 (enrdf_load_stackoverflow) * 1976-07-20 1980-05-22

Also Published As

Publication number Publication date
JPS55124847U (enrdf_load_stackoverflow) 1980-09-04

Similar Documents

Publication Publication Date Title
US5297956A (en) Method and apparatus for heat treating
JP2780866B2 (ja) 光照射加熱基板の温度測定装置
JP2781616B2 (ja) 半導体ウエハの熱処理装置
US3842794A (en) Apparatus for high temperature semiconductor processing
JPH0917742A (ja) 熱処理装置
JPS5824437Y2 (ja) 半導体熱処理容器
US5645417A (en) Dimpled thermal processing furnace tube
JP3785650B2 (ja) 枚葉式熱処理装置
KR0147826B1 (ko) 종형열처리장치
US3943015A (en) Method for high temperature semiconductor processing
JP2764436B2 (ja) 縦型拡散炉
JPS63181315A (ja) 熱処理装置
JP2676083B2 (ja) 加熱炉
JPH09320974A (ja) 熱処理装置
JPH0554690B2 (enrdf_load_stackoverflow)
JPS586136A (ja) 半導体ウエ−ハの熱処理法
KR940000403Y1 (ko) 반도체 웨이퍼용 석영튜브구조
JPS58294Y2 (ja) 半導体拡散炉
JPH0493026A (ja) 絶縁膜形成装置
JPH06310454A (ja) ホットウォール型熱処理装置
JP2001267250A (ja) 半導体製造装置
JPS5828358Y2 (ja) 多層板型輻射遮断体
JPH07106274A (ja) 試料加熱法および試料熱処理装置
KR20000011509U (ko) 저압 화상기상증착 장치의 반응로
KR0121711Y1 (ko) 핫-월형 고속 열처리장치