JPS58210622A - 電子ビ−ム露光方法 - Google Patents

電子ビ−ム露光方法

Info

Publication number
JPS58210622A
JPS58210622A JP9387982A JP9387982A JPS58210622A JP S58210622 A JPS58210622 A JP S58210622A JP 9387982 A JP9387982 A JP 9387982A JP 9387982 A JP9387982 A JP 9387982A JP S58210622 A JPS58210622 A JP S58210622A
Authority
JP
Japan
Prior art keywords
electron beam
wafer
stage
coordinate system
coordinates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9387982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0336297B2 (enExample
Inventor
Takayuki Miyazaki
宮崎　隆之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9387982A priority Critical patent/JPS58210622A/ja
Publication of JPS58210622A publication Critical patent/JPS58210622A/ja
Publication of JPH0336297B2 publication Critical patent/JPH0336297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP9387982A 1982-06-01 1982-06-01 電子ビ−ム露光方法 Granted JPS58210622A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9387982A JPS58210622A (ja) 1982-06-01 1982-06-01 電子ビ−ム露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9387982A JPS58210622A (ja) 1982-06-01 1982-06-01 電子ビ−ム露光方法

Publications (2)

Publication Number Publication Date
JPS58210622A true JPS58210622A (ja) 1983-12-07
JPH0336297B2 JPH0336297B2 (enExample) 1991-05-31

Family

ID=14094757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9387982A Granted JPS58210622A (ja) 1982-06-01 1982-06-01 電子ビ−ム露光方法

Country Status (1)

Country Link
JP (1) JPS58210622A (enExample)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627928A (en) * 1979-08-14 1981-03-18 Toshiba Corp Electron beam projector
JPS5742128A (en) * 1980-08-27 1982-03-09 Fujitsu Ltd Exposing method by electron beam
JPS5760838A (en) * 1980-09-30 1982-04-13 Fujitsu Ltd Exposure for electron beam

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627928A (en) * 1979-08-14 1981-03-18 Toshiba Corp Electron beam projector
JPS5742128A (en) * 1980-08-27 1982-03-09 Fujitsu Ltd Exposing method by electron beam
JPS5760838A (en) * 1980-09-30 1982-04-13 Fujitsu Ltd Exposure for electron beam

Also Published As

Publication number Publication date
JPH0336297B2 (enExample) 1991-05-31

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