JPS58209123A - 基板加工法 - Google Patents

基板加工法

Info

Publication number
JPS58209123A
JPS58209123A JP57091397A JP9139782A JPS58209123A JP S58209123 A JPS58209123 A JP S58209123A JP 57091397 A JP57091397 A JP 57091397A JP 9139782 A JP9139782 A JP 9139782A JP S58209123 A JPS58209123 A JP S58209123A
Authority
JP
Japan
Prior art keywords
film
substrate
polymer film
pattern
carbonized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57091397A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219053B2 (OSRAM
Inventor
Masao Morita
雅夫 森田
Saburo Imamura
三郎 今村
Toshiaki Tamamura
敏昭 玉村
Osamu Kogure
小暮　攻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57091397A priority Critical patent/JPS58209123A/ja
Publication of JPS58209123A publication Critical patent/JPS58209123A/ja
Publication of JPS6219053B2 publication Critical patent/JPS6219053B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57091397A 1982-05-31 1982-05-31 基板加工法 Granted JPS58209123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57091397A JPS58209123A (ja) 1982-05-31 1982-05-31 基板加工法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57091397A JPS58209123A (ja) 1982-05-31 1982-05-31 基板加工法

Publications (2)

Publication Number Publication Date
JPS58209123A true JPS58209123A (ja) 1983-12-06
JPS6219053B2 JPS6219053B2 (OSRAM) 1987-04-25

Family

ID=14025245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57091397A Granted JPS58209123A (ja) 1982-05-31 1982-05-31 基板加工法

Country Status (1)

Country Link
JP (1) JPS58209123A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US5218471A (en) * 1987-09-21 1993-06-08 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
USRE36352E (en) * 1987-09-21 1999-10-26 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements

Also Published As

Publication number Publication date
JPS6219053B2 (OSRAM) 1987-04-25

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