JPS58194241A - イオン注入装置のタ−ゲツト冷却装置 - Google Patents
イオン注入装置のタ−ゲツト冷却装置Info
- Publication number
- JPS58194241A JPS58194241A JP57078715A JP7871582A JPS58194241A JP S58194241 A JPS58194241 A JP S58194241A JP 57078715 A JP57078715 A JP 57078715A JP 7871582 A JP7871582 A JP 7871582A JP S58194241 A JPS58194241 A JP S58194241A
- Authority
- JP
- Japan
- Prior art keywords
- cooling
- disk
- rotary joint
- shaft
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001816 cooling Methods 0.000 title claims description 56
- 239000002826 coolant Substances 0.000 claims description 20
- 238000005468 ion implantation Methods 0.000 description 21
- 235000012431 wafers Nutrition 0.000 description 14
- 150000002500 ions Chemical class 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 4
- 241000257465 Echinoidea Species 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57078715A JPS58194241A (ja) | 1982-05-10 | 1982-05-10 | イオン注入装置のタ−ゲツト冷却装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57078715A JPS58194241A (ja) | 1982-05-10 | 1982-05-10 | イオン注入装置のタ−ゲツト冷却装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58194241A true JPS58194241A (ja) | 1983-11-12 |
| JPS6259409B2 JPS6259409B2 (https=) | 1987-12-10 |
Family
ID=13669562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57078715A Granted JPS58194241A (ja) | 1982-05-10 | 1982-05-10 | イオン注入装置のタ−ゲツト冷却装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58194241A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008021340A3 (en) * | 2006-08-17 | 2008-07-17 | Axcelis Tech Inc | Workpiece handling scan arm for ion implantation system |
| WO2018142459A1 (ja) * | 2017-01-31 | 2018-08-09 | 住友重機械工業株式会社 | ターゲット装置 |
| JP2021059755A (ja) * | 2019-10-07 | 2021-04-15 | キヤノントッキ株式会社 | 成膜装置、成膜方法および電子デバイスの製造方法 |
-
1982
- 1982-05-10 JP JP57078715A patent/JPS58194241A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008021340A3 (en) * | 2006-08-17 | 2008-07-17 | Axcelis Tech Inc | Workpiece handling scan arm for ion implantation system |
| CN101517725B (zh) | 2006-08-17 | 2011-09-07 | 艾克塞利斯科技公司 | 用于离子注入系统的工件处理扫描臂 |
| WO2018142459A1 (ja) * | 2017-01-31 | 2018-08-09 | 住友重機械工業株式会社 | ターゲット装置 |
| JP2021059755A (ja) * | 2019-10-07 | 2021-04-15 | キヤノントッキ株式会社 | 成膜装置、成膜方法および電子デバイスの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6259409B2 (https=) | 1987-12-10 |
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