JPS5478091A - Ion implanting unit - Google Patents

Ion implanting unit

Info

Publication number
JPS5478091A
JPS5478091A JP14497177A JP14497177A JPS5478091A JP S5478091 A JPS5478091 A JP S5478091A JP 14497177 A JP14497177 A JP 14497177A JP 14497177 A JP14497177 A JP 14497177A JP S5478091 A JPS5478091 A JP S5478091A
Authority
JP
Japan
Prior art keywords
container
motor
driving part
rotation driving
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14497177A
Other languages
Japanese (ja)
Inventor
Masao Tsugi
Toshihiko Honda
Seiichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14497177A priority Critical patent/JPS5478091A/en
Publication of JPS5478091A publication Critical patent/JPS5478091A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To evade contamination caused by dust floating in an airtight container, and to uniform the amount of implanted ions by making small a difference in ion- beam irradiation-transit time among respective parts of a processed wafer and by irradiating respective parts with perpendicular beams.
CONSTITUTION: Outside external container 1 made vacuous and airtight, the reciprocative driving part composed of motor 2 and reciprocation converting mechanism 3 is provided and its reciprocative shaft 4 is interlocked to the rotation driving part in the container. This rotation driving consists of support table 5 and motor 6, and shaft 7 of motor 6 is provided at its tip with rotary disc 8 which rotated in external container 1. Next, a plural number of wafers, arrayed and fixed along the circumference of rotary disc 8, are irradiated with ion beams from the ion generator fixed inside airtight chamber 1. In addition, the circumference of the rotation driving part is surrounded with small container 1, and bellows 11 is interposed reaching external container 1. On the other hand, magnetic flux seal 12 is provided between rotary shaft 7 and small container 10 to maintain the airtightness of small container 10.
COPYRIGHT: (C)1979,JPO&Japio
JP14497177A 1977-12-05 1977-12-05 Ion implanting unit Pending JPS5478091A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14497177A JPS5478091A (en) 1977-12-05 1977-12-05 Ion implanting unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14497177A JPS5478091A (en) 1977-12-05 1977-12-05 Ion implanting unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP24396785A Division JPS61114456A (en) 1985-11-01 1985-11-01 Ion implantation equipment

Publications (1)

Publication Number Publication Date
JPS5478091A true JPS5478091A (en) 1979-06-21

Family

ID=15374446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14497177A Pending JPS5478091A (en) 1977-12-05 1977-12-05 Ion implanting unit

Country Status (1)

Country Link
JP (1) JPS5478091A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669826A (en) * 1979-11-09 1981-06-11 Hitachi Ltd Ion injector
JPS56126918A (en) * 1980-03-11 1981-10-05 Hitachi Ltd Injecting device for ion
JPS59108253A (en) * 1983-11-07 1984-06-22 Hitachi Ltd Ion implanting device
JPS61116746A (en) * 1984-09-19 1986-06-04 アプライド　マテリアルズ　インコ−ポレ−テツド Apparatus and method for ion plantation of semiconductor wafer
JPS61501353A (en) * 1984-03-06 1986-07-03 マクグワイヤ，エドワ−ド・レオ・ザ・サ−ド Scan controller for ion implanter
JPS63218140A (en) * 1987-03-06 1988-09-12 Nec Yamagata Ltd Ion implanting apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5669826A (en) * 1979-11-09 1981-06-11 Hitachi Ltd Ion injector
JPS623543B2 (en) * 1979-11-09 1987-01-26 Hitachi Ltd
JPS56126918A (en) * 1980-03-11 1981-10-05 Hitachi Ltd Injecting device for ion
JPS59108253A (en) * 1983-11-07 1984-06-22 Hitachi Ltd Ion implanting device
JPS61501353A (en) * 1984-03-06 1986-07-03 マクグワイヤ，エドワ−ド・レオ・ザ・サ−ド Scan controller for ion implanter
JPS61116746A (en) * 1984-09-19 1986-06-04 アプライド　マテリアルズ　インコ−ポレ−テツド Apparatus and method for ion plantation of semiconductor wafer
JPH06111752A (en) * 1984-09-19 1994-04-22 Applied Materials Inc Method and apparatus for ion implantation of semiconductor wafer
JPS63218140A (en) * 1987-03-06 1988-09-12 Nec Yamagata Ltd Ion implanting apparatus

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