JPS58193726A - 蒸着方法 - Google Patents

蒸着方法

Info

Publication number
JPS58193726A
JPS58193726A JP7601082A JP7601082A JPS58193726A JP S58193726 A JPS58193726 A JP S58193726A JP 7601082 A JP7601082 A JP 7601082A JP 7601082 A JP7601082 A JP 7601082A JP S58193726 A JPS58193726 A JP S58193726A
Authority
JP
Japan
Prior art keywords
vapor deposition
substrate
plasma
deposition method
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7601082A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6150147B2 (enrdf_load_stackoverflow
Inventor
Tatsumi Hiramoto
立躬 平本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP7601082A priority Critical patent/JPS58193726A/ja
Publication of JPS58193726A publication Critical patent/JPS58193726A/ja
Publication of JPS6150147B2 publication Critical patent/JPS6150147B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP7601082A 1982-05-08 1982-05-08 蒸着方法 Granted JPS58193726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7601082A JPS58193726A (ja) 1982-05-08 1982-05-08 蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7601082A JPS58193726A (ja) 1982-05-08 1982-05-08 蒸着方法

Publications (2)

Publication Number Publication Date
JPS58193726A true JPS58193726A (ja) 1983-11-11
JPS6150147B2 JPS6150147B2 (enrdf_load_stackoverflow) 1986-11-01

Family

ID=13592843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7601082A Granted JPS58193726A (ja) 1982-05-08 1982-05-08 蒸着方法

Country Status (1)

Country Link
JP (1) JPS58193726A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209247A (ja) * 1984-04-02 1985-10-21 Ushio Inc 光化学反応装置
JPS62227089A (ja) * 1986-03-27 1987-10-06 Anelva Corp 表面処理方法および装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57159016A (en) * 1981-03-26 1982-10-01 Sumitomo Electric Ind Ltd Manufacture of amorphous silicon film
JPS58176923A (ja) * 1982-04-09 1983-10-17 Jeol Ltd プラズマｃｖｄ装置
JPS59126500U (ja) * 1983-02-15 1984-08-25 株式会社日立国際電気 プラズマ発生装置の拡散防止装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57159016A (en) * 1981-03-26 1982-10-01 Sumitomo Electric Ind Ltd Manufacture of amorphous silicon film
JPS58176923A (ja) * 1982-04-09 1983-10-17 Jeol Ltd プラズマｃｖｄ装置
JPS59126500U (ja) * 1983-02-15 1984-08-25 株式会社日立国際電気 プラズマ発生装置の拡散防止装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60209247A (ja) * 1984-04-02 1985-10-21 Ushio Inc 光化学反応装置
JPS62227089A (ja) * 1986-03-27 1987-10-06 Anelva Corp 表面処理方法および装置

Also Published As

Publication number Publication date
JPS6150147B2 (enrdf_load_stackoverflow) 1986-11-01

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