JPS58169977A - 薄膜トランジスタの製造方法 - Google Patents
薄膜トランジスタの製造方法Info
- Publication number
- JPS58169977A JPS58169977A JP57053539A JP5353982A JPS58169977A JP S58169977 A JPS58169977 A JP S58169977A JP 57053539 A JP57053539 A JP 57053539A JP 5353982 A JP5353982 A JP 5353982A JP S58169977 A JPS58169977 A JP S58169977A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- film transistor
- silicon
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Landscapes
- Electrodes Of Semiconductors (AREA)
- Thin Film Transistor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57053539A JPS58169977A (ja) | 1982-03-30 | 1982-03-30 | 薄膜トランジスタの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57053539A JPS58169977A (ja) | 1982-03-30 | 1982-03-30 | 薄膜トランジスタの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58169977A true JPS58169977A (ja) | 1983-10-06 |
| JPH0544184B2 JPH0544184B2 (enrdf_load_stackoverflow) | 1993-07-05 |
Family
ID=12945605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57053539A Granted JPS58169977A (ja) | 1982-03-30 | 1982-03-30 | 薄膜トランジスタの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58169977A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4999690A (en) * | 1989-12-19 | 1991-03-12 | Texas Instruments Incorporated | Transistor |
| US5231296A (en) * | 1989-12-19 | 1993-07-27 | Texas Instruments Incorporated | Thin film transistor structure with insulating mask |
| JPH06132304A (ja) * | 1992-03-03 | 1994-05-13 | Semiconductor Energy Lab Co Ltd | 半導体装置作製方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687362A (en) * | 1979-12-18 | 1981-07-15 | Toshiba Corp | Manufacture of semiconductor device |
| JPS56135968A (en) * | 1980-03-27 | 1981-10-23 | Canon Inc | Amorphous silicon thin film transistor and manufacture thereof |
| JPS56161656A (en) * | 1980-05-16 | 1981-12-12 | Nec Kyushu Ltd | Manufacture of semiconductor device |
| JPS5721867A (en) * | 1980-06-02 | 1982-02-04 | Xerox Corp | Planar thin film transistor array and method of producing same |
-
1982
- 1982-03-30 JP JP57053539A patent/JPS58169977A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687362A (en) * | 1979-12-18 | 1981-07-15 | Toshiba Corp | Manufacture of semiconductor device |
| JPS56135968A (en) * | 1980-03-27 | 1981-10-23 | Canon Inc | Amorphous silicon thin film transistor and manufacture thereof |
| JPS56161656A (en) * | 1980-05-16 | 1981-12-12 | Nec Kyushu Ltd | Manufacture of semiconductor device |
| JPS5721867A (en) * | 1980-06-02 | 1982-02-04 | Xerox Corp | Planar thin film transistor array and method of producing same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4999690A (en) * | 1989-12-19 | 1991-03-12 | Texas Instruments Incorporated | Transistor |
| US5231296A (en) * | 1989-12-19 | 1993-07-27 | Texas Instruments Incorporated | Thin film transistor structure with insulating mask |
| JPH06132304A (ja) * | 1992-03-03 | 1994-05-13 | Semiconductor Energy Lab Co Ltd | 半導体装置作製方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0544184B2 (enrdf_load_stackoverflow) | 1993-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4253888A (en) | Pretreatment of photoresist masking layers resulting in higher temperature device processing | |
| JPH0687503B2 (ja) | 薄膜半導体装置 | |
| JPS62124775A (ja) | 傾斜エツチングによる薄膜トランジスタの製造方法および薄膜トランジスタ | |
| JPS58169977A (ja) | 薄膜トランジスタの製造方法 | |
| JP2644743B2 (ja) | 液晶表示装置の製造方法 | |
| JPH043469A (ja) | 薄膜トランジスタ及びその製造方法 | |
| JPS5940571A (ja) | 半導体装置 | |
| JPH05335578A (ja) | 薄膜トランジスタの製造方法 | |
| JPH0136256B2 (enrdf_load_stackoverflow) | ||
| JPH0247853B2 (enrdf_load_stackoverflow) | ||
| JPH06151460A (ja) | 逆スタッガ型tftの製造方法 | |
| JPS6220711B2 (enrdf_load_stackoverflow) | ||
| JPH07273342A (ja) | 薄膜トランジスタの製造方法 | |
| JPH09237567A (ja) | 冷陰極素子及びその製造方法 | |
| JPH035656B2 (enrdf_load_stackoverflow) | ||
| JPS62108541A (ja) | 半導体装置の製造方法 | |
| JPH06209011A (ja) | 薄膜トランジスターの製造方法 | |
| JP3537198B2 (ja) | 半導体装置の作製方法 | |
| JPS5856261B2 (ja) | 半導体集積回路の製造方法 | |
| JPH01297620A (ja) | 透明電極の形成方法 | |
| JPS61240656A (ja) | 半導体装置の製造方法 | |
| JPS60226160A (ja) | 薄膜抵抗装置の製造方法 | |
| JPS63153859A (ja) | 半導体素子の製造方法 | |
| JPS61113259A (ja) | 半導体装置の製造方法 | |
| JPH08153728A (ja) | アルミニウム配線の加工方法 |