JPS58164282A - 半導体レ−ザ装置の製造方法 - Google Patents

半導体レ−ザ装置の製造方法

Info

Publication number
JPS58164282A
JPS58164282A JP4560982A JP4560982A JPS58164282A JP S58164282 A JPS58164282 A JP S58164282A JP 4560982 A JP4560982 A JP 4560982A JP 4560982 A JP4560982 A JP 4560982A JP S58164282 A JPS58164282 A JP S58164282A
Authority
JP
Japan
Prior art keywords
layer
type
light
carrier confinement
striped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4560982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6258679B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Satoru Todoroki
轟 悟
Hisatoshi Uchida
内田 久敏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4560982A priority Critical patent/JPS58164282A/ja
Publication of JPS58164282A publication Critical patent/JPS58164282A/ja
Publication of JPS6258679B2 publication Critical patent/JPS6258679B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2231Buried stripe structure with inner confining structure only between the active layer and the upper electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2232Buried stripe structure with inner confining structure between the active layer and the lower electrode

Landscapes

  • Semiconductor Lasers (AREA)
JP4560982A 1982-03-24 1982-03-24 半導体レ−ザ装置の製造方法 Granted JPS58164282A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4560982A JPS58164282A (ja) 1982-03-24 1982-03-24 半導体レ−ザ装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4560982A JPS58164282A (ja) 1982-03-24 1982-03-24 半導体レ−ザ装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58164282A true JPS58164282A (ja) 1983-09-29
JPS6258679B2 JPS6258679B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-07

Family

ID=12724102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4560982A Granted JPS58164282A (ja) 1982-03-24 1982-03-24 半導体レ−ザ装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58164282A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0735074U (ja) * 1993-12-14 1995-06-27 株式会社スガタ ポストカードホルダー
AU707822B2 (en) * 1995-07-13 1999-07-22 Koninklijke Philips Electronics N.V. Method and system for data repetition between logically successive clusters

Also Published As

Publication number Publication date
JPS6258679B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-07

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