JPS58154554U - 高周波イオン源 - Google Patents

高周波イオン源

Info

Publication number
JPS58154554U
JPS58154554U JP5153182U JP5153182U JPS58154554U JP S58154554 U JPS58154554 U JP S58154554U JP 5153182 U JP5153182 U JP 5153182U JP 5153182 U JP5153182 U JP 5153182U JP S58154554 U JPS58154554 U JP S58154554U
Authority
JP
Japan
Prior art keywords
electrode
high frequency
plasma
ion source
plasma generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5153182U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0228597Y2 (enrdf_load_stackoverflow
Inventor
土岐　和之
日下部　利和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP5153182U priority Critical patent/JPS58154554U/ja
Publication of JPS58154554U publication Critical patent/JPS58154554U/ja
Application granted granted Critical
Publication of JPH0228597Y2 publication Critical patent/JPH0228597Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP5153182U 1982-04-09 1982-04-09 高周波イオン源 Granted JPS58154554U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5153182U JPS58154554U (ja) 1982-04-09 1982-04-09 高周波イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5153182U JPS58154554U (ja) 1982-04-09 1982-04-09 高周波イオン源

Publications (2)

Publication Number Publication Date
JPS58154554U true JPS58154554U (ja) 1983-10-15
JPH0228597Y2 JPH0228597Y2 (enrdf_load_stackoverflow) 1990-07-31

Family

ID=30062239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5153182U Granted JPS58154554U (ja) 1982-04-09 1982-04-09 高周波イオン源

Country Status (1)

Country Link
JP (1) JPS58154554U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61138432A (ja) * 1984-12-11 1986-06-25 Hitachi Ltd 高周波プラズマ発生装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52156289A (en) * 1976-06-18 1977-12-26 Wabco Westinghouse Gmbh Antilock regulating apparatus for vehicle brake apparatus operated pressurized medium for road vehicle
JPS56148862U (enrdf_load_stackoverflow) * 1980-04-09 1981-11-09

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52156289A (en) * 1976-06-18 1977-12-26 Wabco Westinghouse Gmbh Antilock regulating apparatus for vehicle brake apparatus operated pressurized medium for road vehicle
JPS56148862U (enrdf_load_stackoverflow) * 1980-04-09 1981-11-09

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61138432A (ja) * 1984-12-11 1986-06-25 Hitachi Ltd 高周波プラズマ発生装置

Also Published As

Publication number Publication date
JPH0228597Y2 (enrdf_load_stackoverflow) 1990-07-31

Similar Documents

Publication Publication Date Title
JPS58154554U (ja) 高周波イオン源
JPS5983971U (ja) イオンプレ−テイング装置
JPS59187136U (ja) 半導体薄膜形成装置
JPS5912258U (ja) 電子線照射装置
JPS5974659U (ja) イオン注入装置のイオン発生装置
JPS58160263U (ja) Ｇｄ−ｃｖｄ装置
JPH0379152U (enrdf_load_stackoverflow)
JPS5944770U (ja) プラズマｃｖｄ装置
JPS6214724U (enrdf_load_stackoverflow)
JPS5986700U (ja) プラズマ装置用放電々極
JPS60121252U (ja) 質量分析装置用イオン源
JPH02115244U (enrdf_load_stackoverflow)
JPS6319745U (enrdf_load_stackoverflow)
JPS60140763U (ja) プラズマ装置
JPS5969965U (ja) グロ−放電発生装置
JPS59103267U (ja) ガスクロマトグラフ質量分析装置
JPS5951061U (ja) 高周波イオン・プレ−テイング装置
JPS60122362U (ja) プラズマエツチング装置
JPS60154854U (ja) 液体クロマトグラフ質量分析装置
JPS5948738U (ja) イオン源
JPS6033753U (ja) 超高真空用イオンポンプ
JPS60185656U (ja) 高周波スパツタ装置
JPS58160262U (ja) Ｇｄ−ｃｖｄ装置
JPS6124469U (ja) イオンプレ−テイング装置
JPS6182958U (enrdf_load_stackoverflow)