JPS58136701A - 微粒子のコーティング方法 - Google Patents
微粒子のコーティング方法Info
- Publication number
- JPS58136701A JPS58136701A JP57017577A JP1757782A JPS58136701A JP S58136701 A JPS58136701 A JP S58136701A JP 57017577 A JP57017577 A JP 57017577A JP 1757782 A JP1757782 A JP 1757782A JP S58136701 A JPS58136701 A JP S58136701A
- Authority
- JP
- Japan
- Prior art keywords
- fine particles
- plasma
- container
- particles
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010419 fine particle Substances 0.000 title claims abstract description 60
- 238000000576 coating method Methods 0.000 title claims description 8
- 239000002245 particle Substances 0.000 claims abstract description 24
- 238000005096 rolling process Methods 0.000 claims abstract description 7
- 238000004381 surface treatment Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 6
- 238000003756 stirring Methods 0.000 claims description 6
- 238000012986 modification Methods 0.000 claims description 4
- 230000004048 modification Effects 0.000 claims description 4
- 238000009832 plasma treatment Methods 0.000 claims 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 27
- 239000007789 gas Substances 0.000 description 27
- 229910052759 nickel Inorganic materials 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000001941 electron spectroscopy Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229920006254 polymer film Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 229910000480 nickel oxide Inorganic materials 0.000 description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57017577A JPS58136701A (ja) | 1982-02-08 | 1982-02-08 | 微粒子のコーティング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57017577A JPS58136701A (ja) | 1982-02-08 | 1982-02-08 | 微粒子のコーティング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58136701A true JPS58136701A (ja) | 1983-08-13 |
| JPH024642B2 JPH024642B2 (enrdf_load_stackoverflow) | 1990-01-30 |
Family
ID=11947760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57017577A Granted JPS58136701A (ja) | 1982-02-08 | 1982-02-08 | 微粒子のコーティング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58136701A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0192373A (ja) * | 1987-09-30 | 1989-04-11 | Ishikawajima Harima Heavy Ind Co Ltd | 比表面積の大きい原料へのｃｖｄによるカーボン薄膜製造方法 |
| JP2002060943A (ja) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | 高純度シリコンの被覆方法及び装置 |
| JP2008169421A (ja) * | 2007-01-10 | 2008-07-24 | Tsubaki Emerson Co | Ｄｌｃ成膜装置 |
| JP2009256804A (ja) * | 2009-08-03 | 2009-11-05 | Utec:Kk | 微粒子 |
| JP2017075391A (ja) * | 2015-08-31 | 2017-04-20 | ウルトラテック インク | 回転反応管を有するプラズマ助長原子層堆積システム |
| EP3484810A4 (en) * | 2016-07-15 | 2020-03-25 | Oned Material LLC | MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SILICON NANOWIRES ON CARBON-BASED POWDERS FOR USE IN BATTERIES |
| JP2020084222A (ja) * | 2018-11-16 | 2020-06-04 | 日本化学工業株式会社 | 被覆粒子の製造方法 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4918751A (enrdf_load_stackoverflow) * | 1972-05-31 | 1974-02-19 | ||
| JPS4944868A (enrdf_load_stackoverflow) * | 1972-09-04 | 1974-04-27 | ||
| JPS5236759A (en) * | 1975-09-18 | 1977-03-22 | Oki Electric Ind Co Ltd | Method of fixing parts on printed circuit board |
| JPS5641375A (en) * | 1979-09-13 | 1981-04-18 | Matsushita Electric Ind Co Ltd | Sputtering apparatus |
| JPS5645962A (en) * | 1979-09-25 | 1981-04-25 | Nippon Tokushu Toryo Kk | Asphaltic coating-type vibration-damping material |
| JPS57166373A (en) * | 1981-04-02 | 1982-10-13 | Sumitomo Electric Industries | Manufacture of non-oxide ceramics |
| JPS5822302A (ja) * | 1981-07-30 | 1983-02-09 | Nippon Steel Corp | 水素吸蔵金属の活性化処理方法 |
| JPS5881971A (ja) * | 1981-11-11 | 1983-05-17 | Matsushita Electric Ind Co Ltd | 着膜装置 |
| JPS58100601A (ja) * | 1981-12-09 | 1983-06-15 | Japan Synthetic Rubber Co Ltd | 被覆超微粒子またはその膜並びに形成方法及び装置 |
-
1982
- 1982-02-08 JP JP57017577A patent/JPS58136701A/ja active Granted
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4918751A (enrdf_load_stackoverflow) * | 1972-05-31 | 1974-02-19 | ||
| JPS4944868A (enrdf_load_stackoverflow) * | 1972-09-04 | 1974-04-27 | ||
| JPS5236759A (en) * | 1975-09-18 | 1977-03-22 | Oki Electric Ind Co Ltd | Method of fixing parts on printed circuit board |
| JPS5641375A (en) * | 1979-09-13 | 1981-04-18 | Matsushita Electric Ind Co Ltd | Sputtering apparatus |
| JPS5645962A (en) * | 1979-09-25 | 1981-04-25 | Nippon Tokushu Toryo Kk | Asphaltic coating-type vibration-damping material |
| JPS57166373A (en) * | 1981-04-02 | 1982-10-13 | Sumitomo Electric Industries | Manufacture of non-oxide ceramics |
| JPS5822302A (ja) * | 1981-07-30 | 1983-02-09 | Nippon Steel Corp | 水素吸蔵金属の活性化処理方法 |
| JPS5881971A (ja) * | 1981-11-11 | 1983-05-17 | Matsushita Electric Ind Co Ltd | 着膜装置 |
| JPS58100601A (ja) * | 1981-12-09 | 1983-06-15 | Japan Synthetic Rubber Co Ltd | 被覆超微粒子またはその膜並びに形成方法及び装置 |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0192373A (ja) * | 1987-09-30 | 1989-04-11 | Ishikawajima Harima Heavy Ind Co Ltd | 比表面積の大きい原料へのｃｖｄによるカーボン薄膜製造方法 |
| JP2002060943A (ja) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | 高純度シリコンの被覆方法及び装置 |
| JP2008169421A (ja) * | 2007-01-10 | 2008-07-24 | Tsubaki Emerson Co | Ｄｌｃ成膜装置 |
| JP2009256804A (ja) * | 2009-08-03 | 2009-11-05 | Utec:Kk | 微粒子 |
| JP2017075391A (ja) * | 2015-08-31 | 2017-04-20 | ウルトラテック インク | 回転反応管を有するプラズマ助長原子層堆積システム |
| EP3484810A4 (en) * | 2016-07-15 | 2020-03-25 | Oned Material LLC | MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SILICON NANOWIRES ON CARBON-BASED POWDERS FOR USE IN BATTERIES |
| US10862114B2 (en) | 2016-07-15 | 2020-12-08 | Oned Material Llc | Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries |
| EP3778471A1 (en) * | 2016-07-15 | 2021-02-17 | OneD Material, Inc. | Manufacturing method for making silicon nanowires on carbon based powders for use in batteries |
| US11728477B2 (en) | 2016-07-15 | 2023-08-15 | Oned Material, Inc. | Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries |
| EP4273296A1 (en) * | 2016-07-15 | 2023-11-08 | OneD Material, Inc. | Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries |
| EP4292702A3 (en) * | 2016-07-15 | 2024-04-17 | OneD Material, Inc. | Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries |
| JP2020084222A (ja) * | 2018-11-16 | 2020-06-04 | 日本化学工業株式会社 | 被覆粒子の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH024642B2 (enrdf_load_stackoverflow) | 1990-01-30 |
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