JPS58114030A - ポジ型レジスト材料 - Google Patents

ポジ型レジスト材料

Info

Publication number
JPS58114030A
JPS58114030A JP56209781A JP20978181A JPS58114030A JP S58114030 A JPS58114030 A JP S58114030A JP 56209781 A JP56209781 A JP 56209781A JP 20978181 A JP20978181 A JP 20978181A JP S58114030 A JPS58114030 A JP S58114030A
Authority
JP
Japan
Prior art keywords
resist material
alkali
ester
acid
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56209781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6359131B2 (enrdf_load_stackoverflow
Inventor
Kazuo Toda
和男 戸田
Katsuhiro Fujino
藤野　勝裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56209781A priority Critical patent/JPS58114030A/ja
Publication of JPS58114030A publication Critical patent/JPS58114030A/ja
Publication of JPS6359131B2 publication Critical patent/JPS6359131B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP56209781A 1981-12-28 1981-12-28 ポジ型レジスト材料 Granted JPS58114030A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56209781A JPS58114030A (ja) 1981-12-28 1981-12-28 ポジ型レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56209781A JPS58114030A (ja) 1981-12-28 1981-12-28 ポジ型レジスト材料

Publications (2)

Publication Number Publication Date
JPS58114030A true JPS58114030A (ja) 1983-07-07
JPS6359131B2 JPS6359131B2 (enrdf_load_stackoverflow) 1988-11-17

Family

ID=16578494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56209781A Granted JPS58114030A (ja) 1981-12-28 1981-12-28 ポジ型レジスト材料

Country Status (1)

Country Link
JP (1) JPS58114030A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603625A (ja) * 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd 光可溶化組成物
JPS60205444A (ja) * 1984-02-25 1985-10-17 ヘキスト・アクチエンゲゼルシヤフト 感放射組成物及び感放射記録材料
JPH02136859A (ja) * 1988-11-18 1990-05-25 Nippon Zeon Co Ltd レジスト組成物
JPH03288855A (ja) * 1990-04-05 1991-12-19 Mitsubishi Kasei Corp ポジ型感光性組成物
EP0605089A3 (en) * 1992-11-03 1994-09-21 Ibm Photoresist composition.
US5470996A (en) * 1989-03-20 1995-11-28 Hitachi, Ltd. Pattern forming material and process for forming pattern using the same
US6277546B1 (en) 1992-11-03 2001-08-21 International Business Machines Corporation Process for imaging of photoresist
KR100404003B1 (enrdf_load_stackoverflow) * 1999-08-31 2003-11-05

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS603625A (ja) * 1983-06-22 1985-01-10 Fuji Photo Film Co Ltd 光可溶化組成物
JPS60205444A (ja) * 1984-02-25 1985-10-17 ヘキスト・アクチエンゲゼルシヤフト 感放射組成物及び感放射記録材料
JPH02136859A (ja) * 1988-11-18 1990-05-25 Nippon Zeon Co Ltd レジスト組成物
US5470996A (en) * 1989-03-20 1995-11-28 Hitachi, Ltd. Pattern forming material and process for forming pattern using the same
EP0388813B1 (en) * 1989-03-20 1997-12-10 Hitachi, Ltd. Pattern forming material and process for forming pattern using the same
JPH03288855A (ja) * 1990-04-05 1991-12-19 Mitsubishi Kasei Corp ポジ型感光性組成物
EP0605089A3 (en) * 1992-11-03 1994-09-21 Ibm Photoresist composition.
US5492793A (en) * 1992-11-03 1996-02-20 International Business Machines Corporation Photoresist composition
US6277546B1 (en) 1992-11-03 2001-08-21 International Business Machines Corporation Process for imaging of photoresist
KR100404003B1 (enrdf_load_stackoverflow) * 1999-08-31 2003-11-05

Also Published As

Publication number Publication date
JPS6359131B2 (enrdf_load_stackoverflow) 1988-11-17

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