JPS5810883A - 埋め込みヘテロ構造半導体レ−ザの製造方法 - Google Patents

埋め込みヘテロ構造半導体レ−ザの製造方法

Info

Publication number
JPS5810883A
JPS5810883A JP10968781A JP10968781A JPS5810883A JP S5810883 A JPS5810883 A JP S5810883A JP 10968781 A JP10968781 A JP 10968781A JP 10968781 A JP10968781 A JP 10968781A JP S5810883 A JPS5810883 A JP S5810883A
Authority
JP
Japan
Prior art keywords
layer
active layer
type
inp
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10968781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6248918B2 (enrdf_load_stackoverflow
Inventor
Mitsuhiro Kitamura
北村 光弘
Ikuo Mito
郁夫 水戸
Isao Kobayashi
功郎 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10968781A priority Critical patent/JPS5810883A/ja
Publication of JPS5810883A publication Critical patent/JPS5810883A/ja
Publication of JPS6248918B2 publication Critical patent/JPS6248918B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054Methods of obtaining the confinement
    • H01S5/2059Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Semiconductor Lasers (AREA)
JP10968781A 1981-07-14 1981-07-14 埋め込みヘテロ構造半導体レ−ザの製造方法 Granted JPS5810883A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10968781A JPS5810883A (ja) 1981-07-14 1981-07-14 埋め込みヘテロ構造半導体レ−ザの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10968781A JPS5810883A (ja) 1981-07-14 1981-07-14 埋め込みヘテロ構造半導体レ−ザの製造方法

Publications (2)

Publication Number Publication Date
JPS5810883A true JPS5810883A (ja) 1983-01-21
JPS6248918B2 JPS6248918B2 (enrdf_load_stackoverflow) 1987-10-16

Family

ID=14516639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10968781A Granted JPS5810883A (ja) 1981-07-14 1981-07-14 埋め込みヘテロ構造半導体レ−ザの製造方法

Country Status (1)

Country Link
JP (1) JPS5810883A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6248918B2 (enrdf_load_stackoverflow) 1987-10-16

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