JPS5794482A - Pattern forming device by laser - Google Patents
Pattern forming device by laserInfo
- Publication number
- JPS5794482A JPS5794482A JP55171000A JP17100080A JPS5794482A JP S5794482 A JPS5794482 A JP S5794482A JP 55171000 A JP55171000 A JP 55171000A JP 17100080 A JP17100080 A JP 17100080A JP S5794482 A JPS5794482 A JP S5794482A
- Authority
- JP
- Japan
- Prior art keywords
- laser light
- slit
- laser
- oscillator
- rectangular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0732—Shaping the laser spot into a rectangular shape
Abstract
PURPOSE:To use oscillated laser light effectively and increase the speed of pattern formation by providing an optical system for forming laser light into a long circle between a laser oscillator and a rectangular aperture for forming the laser light into a rectangular shape. CONSTITUTION:A system consisting of circular cylindrical lenses 17, 18 is provided between a laser oscillator 1 and a variable rectangular slit 4. The laser light 2 from the oscillator 1 is expanded of a beam width with a beam expander 16, and is next deformed to a beam of a long circle by a system consisting of circular cylindrical lenses 17, 18. Thence, it is formed to a rectangular shape within the range exceeding a working threshold by a variable slit 4, and is imaged onto the work 6 at 1/M the slit size (M is the magnification of an objective lens 5) as the projected image of the slit 4 by the objective lens 5, whereby it is worked. While the work 6 is scanned by driving an X-Y table 9, the laser light 2 is ON-OFF controlled, whereby a desired pattern is obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55171000A JPS5794482A (en) | 1980-12-05 | 1980-12-05 | Pattern forming device by laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55171000A JPS5794482A (en) | 1980-12-05 | 1980-12-05 | Pattern forming device by laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5794482A true JPS5794482A (en) | 1982-06-11 |
Family
ID=15915246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55171000A Pending JPS5794482A (en) | 1980-12-05 | 1980-12-05 | Pattern forming device by laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5794482A (en) |
Cited By (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6061190A (en) * | 1983-09-06 | 1985-04-08 | イリノイ ツール ワークス インコーポレイテツド | Optical type selective metallic film removing device |
US4527043A (en) * | 1983-02-18 | 1985-07-02 | Hitachi, Ltd. | Laser machining system |
US4635243A (en) * | 1983-12-16 | 1987-01-06 | Canon Kabushiki Kaisha | Optical information processing apparatus |
JPS6240986A (en) * | 1985-08-20 | 1987-02-21 | Fuji Electric Corp Res & Dev Ltd | Laser beam machining method |
JPS62104692A (en) * | 1985-11-01 | 1987-05-15 | Fuji Electric Corp Res & Dev Ltd | Laser beam device |
JPS62142370A (en) * | 1985-12-17 | 1987-06-25 | Fuji Electric Corp Res & Dev Ltd | Manufacture of optical semiconductor device |
JPS62168688A (en) * | 1986-01-21 | 1987-07-24 | Fuji Electric Corp Res & Dev Ltd | Laser beam machining device |
JPS6342364A (en) * | 1986-08-08 | 1988-02-23 | Semiconductor Energy Lab Co Ltd | Processing method for conductive film on substrate |
JPS6360082A (en) * | 1986-08-28 | 1988-03-16 | Semiconductor Energy Lab Co Ltd | Optical processing method |
JPS6384789A (en) * | 1986-09-26 | 1988-04-15 | Semiconductor Energy Lab Co Ltd | Light working method |
JPS63160780A (en) * | 1986-12-23 | 1988-07-04 | Fuji Electric Co Ltd | Laser beam machining device |
JPS63215390A (en) * | 1987-03-04 | 1988-09-07 | Semiconductor Energy Lab Co Ltd | Light machining method |
JPS63220991A (en) * | 1987-03-06 | 1988-09-14 | Semiconductor Energy Lab Co Ltd | Laser beam machining method |
JPH01180796A (en) * | 1987-12-28 | 1989-07-18 | Nippon Steel Corp | Laser beam radiation method |
JPH01181987A (en) * | 1988-01-12 | 1989-07-19 | Nippon Steel Corp | Method and device for controlling irradiation of laser beam |
JPH01306088A (en) * | 1988-06-01 | 1989-12-11 | Nippei Toyama Corp | Variable beam laser processing device |
JPH01309794A (en) * | 1988-06-07 | 1989-12-14 | Matsushita Electric Ind Co Ltd | Production of film capacitor |
JPH06292988A (en) * | 1993-04-16 | 1994-10-21 | Semiconductor Energy Lab Co Ltd | Device and method for film processing |
US5406042A (en) * | 1990-09-17 | 1995-04-11 | U.S. Philips Corporation | Device for and method of providing marks on an object by means of electromagnetic radiation |
JPH08112682A (en) * | 1995-04-28 | 1996-05-07 | Semiconductor Energy Lab Co Ltd | Optical processing method |
US5708252A (en) * | 1986-09-26 | 1998-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Excimer laser scanning system |
US6089698A (en) * | 1992-02-05 | 2000-07-18 | Xaar Technology Limited | Nozzles and methods of and apparatus for forming nozzles |
US6149988A (en) * | 1986-09-26 | 2000-11-21 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
US6204099B1 (en) | 1995-02-21 | 2001-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US6261856B1 (en) | 1987-09-16 | 2001-07-17 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
US6295262B1 (en) | 1997-04-10 | 2001-09-25 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for recording information onto optical disk |
US6331692B1 (en) * | 1996-10-12 | 2001-12-18 | Volker Krause | Diode laser, laser optics, device for laser treatment of a workpiece, process for a laser treatment of workpiece |
US6410374B1 (en) | 1992-12-26 | 2002-06-25 | Semiconductor Energy Laborartory Co., Ltd. | Method of crystallizing a semiconductor layer in a MIS transistor |
US6475839B2 (en) | 1993-11-05 | 2002-11-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing of TFT device by backside laser irradiation |
US6544825B1 (en) | 1992-12-26 | 2003-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating a MIS transistor |
US6638800B1 (en) | 1992-11-06 | 2003-10-28 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing apparatus and laser processing process |
US7169657B2 (en) | 1992-03-26 | 2007-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Process for laser processing and apparatus for use in the same |
WO2007062130A1 (en) * | 2005-11-22 | 2007-05-31 | J.P. Sercel Associates Inc. | System and method for laser machining of three-dimensional structures |
US7411151B2 (en) * | 2002-05-24 | 2008-08-12 | Riken | Method and device for processing inside of transparent material |
CN101990479A (en) * | 2008-03-18 | 2011-03-23 | 万佳雷射有限公司 | Method and apparatus for laser processing the surface of a drum |
KR101084793B1 (en) | 2005-02-01 | 2011-11-21 | 삼성에스디아이 주식회사 | Optical system for laser scan fabrication |
KR20160096462A (en) * | 2015-02-05 | 2016-08-16 | 한국기계연구원 | Apparatus and method of processing anti-counterfeiting pattern |
US10388098B2 (en) | 2014-02-07 | 2019-08-20 | Korea Institute Of Machinery & Materials | Apparatus and method of processing anti-counterfeiting pattern, and apparatus and method of detecting anti-counterfeiting pattern |
JP2020136063A (en) * | 2019-02-19 | 2020-08-31 | 本田技研工業株式会社 | Fuel cell manufacturing method and fuel cell manufacturing apparatus |
-
1980
- 1980-12-05 JP JP55171000A patent/JPS5794482A/en active Pending
Cited By (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4527043A (en) * | 1983-02-18 | 1985-07-02 | Hitachi, Ltd. | Laser machining system |
JPS6061190A (en) * | 1983-09-06 | 1985-04-08 | イリノイ ツール ワークス インコーポレイテツド | Optical type selective metallic film removing device |
JPH04104286U (en) * | 1983-09-06 | 1992-09-08 | イリノイ ツール ワークス インコーポレイテツド | Optical metal coating removal device |
US4635243A (en) * | 1983-12-16 | 1987-01-06 | Canon Kabushiki Kaisha | Optical information processing apparatus |
JPS6240986A (en) * | 1985-08-20 | 1987-02-21 | Fuji Electric Corp Res & Dev Ltd | Laser beam machining method |
JPS62104692A (en) * | 1985-11-01 | 1987-05-15 | Fuji Electric Corp Res & Dev Ltd | Laser beam device |
JPH0453630B2 (en) * | 1985-11-01 | 1992-08-27 | Fuji Denki Sogo Kenkyusho Kk | |
JPS62142370A (en) * | 1985-12-17 | 1987-06-25 | Fuji Electric Corp Res & Dev Ltd | Manufacture of optical semiconductor device |
JPS62168688A (en) * | 1986-01-21 | 1987-07-24 | Fuji Electric Corp Res & Dev Ltd | Laser beam machining device |
JPS6342364A (en) * | 1986-08-08 | 1988-02-23 | Semiconductor Energy Lab Co Ltd | Processing method for conductive film on substrate |
JPS6360082A (en) * | 1986-08-28 | 1988-03-16 | Semiconductor Energy Lab Co Ltd | Optical processing method |
US4861964A (en) * | 1986-09-26 | 1989-08-29 | Semiconductor Energy Laboratory Co., Ltd. | Laser scribing system and method |
US4865686A (en) * | 1986-09-26 | 1989-09-12 | Semiconductor Energy Laboratory Co., Ltd. | Laser scribing method |
US6149988A (en) * | 1986-09-26 | 2000-11-21 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
US5708252A (en) * | 1986-09-26 | 1998-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Excimer laser scanning system |
USRE33947E (en) * | 1986-09-26 | 1992-06-02 | Semiconductor Energy Laboratory Co., Ltd. | Laser scribing method |
JPS6384789A (en) * | 1986-09-26 | 1988-04-15 | Semiconductor Energy Lab Co Ltd | Light working method |
JPH0563274B2 (en) * | 1986-09-26 | 1993-09-10 | Handotai Energy Kenkyusho | |
JPS63160780A (en) * | 1986-12-23 | 1988-07-04 | Fuji Electric Co Ltd | Laser beam machining device |
JPS63215390A (en) * | 1987-03-04 | 1988-09-07 | Semiconductor Energy Lab Co Ltd | Light machining method |
JPS63220991A (en) * | 1987-03-06 | 1988-09-14 | Semiconductor Energy Lab Co Ltd | Laser beam machining method |
US6261856B1 (en) | 1987-09-16 | 2001-07-17 | Semiconductor Energy Laboratory Co., Ltd. | Method and system of laser processing |
JPH01180796A (en) * | 1987-12-28 | 1989-07-18 | Nippon Steel Corp | Laser beam radiation method |
JPH0455785B2 (en) * | 1987-12-28 | 1992-09-04 | Nippon Steel Corp | |
JPH01181987A (en) * | 1988-01-12 | 1989-07-19 | Nippon Steel Corp | Method and device for controlling irradiation of laser beam |
JPH01306088A (en) * | 1988-06-01 | 1989-12-11 | Nippei Toyama Corp | Variable beam laser processing device |
JPH01309794A (en) * | 1988-06-07 | 1989-12-14 | Matsushita Electric Ind Co Ltd | Production of film capacitor |
US5406042A (en) * | 1990-09-17 | 1995-04-11 | U.S. Philips Corporation | Device for and method of providing marks on an object by means of electromagnetic radiation |
US6089698A (en) * | 1992-02-05 | 2000-07-18 | Xaar Technology Limited | Nozzles and methods of and apparatus for forming nozzles |
US7781271B2 (en) | 1992-03-26 | 2010-08-24 | Semiconductor Energy Laboratory Co., Ltd. | Process for laser processing and apparatus for use in the same |
US7169657B2 (en) | 1992-03-26 | 2007-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Process for laser processing and apparatus for use in the same |
US6638800B1 (en) | 1992-11-06 | 2003-10-28 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing apparatus and laser processing process |
US7799665B2 (en) | 1992-11-06 | 2010-09-21 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing apparatus and laser processing process |
US7179726B2 (en) | 1992-11-06 | 2007-02-20 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing apparatus and laser processing process |
US7351615B2 (en) | 1992-12-26 | 2008-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating a MIS transistor |
US6410374B1 (en) | 1992-12-26 | 2002-06-25 | Semiconductor Energy Laborartory Co., Ltd. | Method of crystallizing a semiconductor layer in a MIS transistor |
US6544825B1 (en) | 1992-12-26 | 2003-04-08 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating a MIS transistor |
JPH06292988A (en) * | 1993-04-16 | 1994-10-21 | Semiconductor Energy Lab Co Ltd | Device and method for film processing |
US6475839B2 (en) | 1993-11-05 | 2002-11-05 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing of TFT device by backside laser irradiation |
US6617612B2 (en) | 1993-11-05 | 2003-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and a semiconductor integrated circuit |
US6204099B1 (en) | 1995-02-21 | 2001-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US7045403B2 (en) | 1995-02-21 | 2006-05-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US6921686B2 (en) | 1995-02-21 | 2005-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US6709905B2 (en) | 1995-02-21 | 2004-03-23 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US7615423B2 (en) | 1995-02-21 | 2009-11-10 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
US6265745B1 (en) | 1995-02-21 | 2001-07-24 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing insulated gate thin film semiconductor device |
JPH08112682A (en) * | 1995-04-28 | 1996-05-07 | Semiconductor Energy Lab Co Ltd | Optical processing method |
US6331692B1 (en) * | 1996-10-12 | 2001-12-18 | Volker Krause | Diode laser, laser optics, device for laser treatment of a workpiece, process for a laser treatment of workpiece |
US6295262B1 (en) | 1997-04-10 | 2001-09-25 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus for recording information onto optical disk |
US7411151B2 (en) * | 2002-05-24 | 2008-08-12 | Riken | Method and device for processing inside of transparent material |
KR101084793B1 (en) | 2005-02-01 | 2011-11-21 | 삼성에스디아이 주식회사 | Optical system for laser scan fabrication |
WO2007062130A1 (en) * | 2005-11-22 | 2007-05-31 | J.P. Sercel Associates Inc. | System and method for laser machining of three-dimensional structures |
US8552338B2 (en) | 2005-11-22 | 2013-10-08 | Ipg Microsystems Llc | System and method for laser machining of three-dimensional structures |
CN101990479A (en) * | 2008-03-18 | 2011-03-23 | 万佳雷射有限公司 | Method and apparatus for laser processing the surface of a drum |
US10388098B2 (en) | 2014-02-07 | 2019-08-20 | Korea Institute Of Machinery & Materials | Apparatus and method of processing anti-counterfeiting pattern, and apparatus and method of detecting anti-counterfeiting pattern |
KR20160096462A (en) * | 2015-02-05 | 2016-08-16 | 한국기계연구원 | Apparatus and method of processing anti-counterfeiting pattern |
JP2020136063A (en) * | 2019-02-19 | 2020-08-31 | 本田技研工業株式会社 | Fuel cell manufacturing method and fuel cell manufacturing apparatus |
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