JPS56111227A - Laser working device with projection method using iris diaphragm - Google Patents
Laser working device with projection method using iris diaphragmInfo
- Publication number
- JPS56111227A JPS56111227A JP1372980A JP1372980A JPS56111227A JP S56111227 A JPS56111227 A JP S56111227A JP 1372980 A JP1372980 A JP 1372980A JP 1372980 A JP1372980 A JP 1372980A JP S56111227 A JPS56111227 A JP S56111227A
- Authority
- JP
- Japan
- Prior art keywords
- defect
- iris diaphragm
- size
- image
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laser Beam Processing (AREA)
Abstract
PURPOSE:To make it possible to work on a defect on a photomask without affecting the adjacent areas, by measuring the size L of the workpiece pattern and adjusting the iris diaphragm to a level (w) determined by the laser beam output P and L. CONSTITUTION:The laser beam 2 proceeds through an iris diaphragm 4 having two pairs of slit whose position and width are exchangeable independently to each other and through a lens 5 where automatic focusing 17 is performed, and the reduced image of the iris diaphragm is formed on a defect 7 on a photomask 6. An image control part 10 emits to a display device 11 two sets of electronic lines which are adjustable independently, and the position and the size of the defect is measured by the signal intervals L of the position of the lines surrounding the defect image 14 and the magnification (k) of the image. Then the table 16 is operated according to the informations thus obtained to align the light axis to the center of the defect. The size of the iris diaphragm to be obtained and adjusted 3 is determined 18 by the measured size L and the preliminarily fixed laser beam output P. With such an arrangement, every process is performed automatically and the precise work can be performed according to the size of the workpiece, without affecting the adjacent areas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1372980A JPS56111227A (en) | 1980-02-08 | 1980-02-08 | Laser working device with projection method using iris diaphragm |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1372980A JPS56111227A (en) | 1980-02-08 | 1980-02-08 | Laser working device with projection method using iris diaphragm |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56111227A true JPS56111227A (en) | 1981-09-02 |
JPS625335B2 JPS625335B2 (en) | 1987-02-04 |
Family
ID=11841321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1372980A Granted JPS56111227A (en) | 1980-02-08 | 1980-02-08 | Laser working device with projection method using iris diaphragm |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56111227A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04251687A (en) * | 1991-01-23 | 1992-09-08 | Fanuc Ltd | Laser beam controller |
US5670067A (en) * | 1993-08-04 | 1997-09-23 | Fujitsu Limited | Apparatus for laser cutting wiring in accordance with a measured size of the wiring |
US6678304B2 (en) | 2000-08-22 | 2004-01-13 | Nec Corporation | Laser correction method and apparatus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5456370A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Mask pattern correcting method and mask pattern correcting device used for said method |
JPS54105968A (en) * | 1978-02-08 | 1979-08-20 | Toshiba Corp | Defect corrector for pattern |
-
1980
- 1980-02-08 JP JP1372980A patent/JPS56111227A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5456370A (en) * | 1977-10-14 | 1979-05-07 | Hitachi Ltd | Mask pattern correcting method and mask pattern correcting device used for said method |
JPS54105968A (en) * | 1978-02-08 | 1979-08-20 | Toshiba Corp | Defect corrector for pattern |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04251687A (en) * | 1991-01-23 | 1992-09-08 | Fanuc Ltd | Laser beam controller |
US5670067A (en) * | 1993-08-04 | 1997-09-23 | Fujitsu Limited | Apparatus for laser cutting wiring in accordance with a measured size of the wiring |
US6678304B2 (en) | 2000-08-22 | 2004-01-13 | Nec Corporation | Laser correction method and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS625335B2 (en) | 1987-02-04 |
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