JPS56164345A - Photomask correcting device - Google Patents

Photomask correcting device

Info

Publication number
JPS56164345A
JPS56164345A JP6793080A JP6793080A JPS56164345A JP S56164345 A JPS56164345 A JP S56164345A JP 6793080 A JP6793080 A JP 6793080A JP 6793080 A JP6793080 A JP 6793080A JP S56164345 A JPS56164345 A JP S56164345A
Authority
JP
Japan
Prior art keywords
beams
slit
laser
emitted
changed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6793080A
Other languages
Japanese (ja)
Inventor
Ryuji Tatsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6793080A priority Critical patent/JPS56164345A/en
Publication of JPS56164345A publication Critical patent/JPS56164345A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a high precision device capable of performing minute erasion by inserting an optical fiber system between a laser system and an optical system for correction in order to combine both of them. CONSTITUTION:Laser beams (a) emitted from a laser device 1 passes through an optical fiber system 2-2, the coherency is lowered by this passing, and the intensity distribution is changed into a flat shape. The laser beams thus changed in mode are enlarged with a beam expander 3-1, then, adjusted with a first combining mirror 3-4 so as to have an optical axis is common with a reference light (b) emitted from a reference light source 3-3, and the beams are made to incident to a variable rectangular slit mechanism 3-2. The beams (a) and the light (b) restricted with a slit mechanism 3-2 are reflected with the second combining mirror 3-5, and then, the image of the slit 3-2 is formed on the face of a photomask 5 with an objective lens 3-6, thus permitting the slit image to be processed.
JP6793080A 1980-05-23 1980-05-23 Photomask correcting device Pending JPS56164345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6793080A JPS56164345A (en) 1980-05-23 1980-05-23 Photomask correcting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6793080A JPS56164345A (en) 1980-05-23 1980-05-23 Photomask correcting device

Publications (1)

Publication Number Publication Date
JPS56164345A true JPS56164345A (en) 1981-12-17

Family

ID=13359118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6793080A Pending JPS56164345A (en) 1980-05-23 1980-05-23 Photomask correcting device

Country Status (1)

Country Link
JP (1) JPS56164345A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5010631U (en) * 1973-05-31 1975-02-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5010631U (en) * 1973-05-31 1975-02-03

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