JPS54105968A - Defect corrector for pattern - Google Patents

Defect corrector for pattern

Info

Publication number
JPS54105968A
JPS54105968A JP1236878A JP1236878A JPS54105968A JP S54105968 A JPS54105968 A JP S54105968A JP 1236878 A JP1236878 A JP 1236878A JP 1236878 A JP1236878 A JP 1236878A JP S54105968 A JPS54105968 A JP S54105968A
Authority
JP
Japan
Prior art keywords
light
pattern
transmitted
coherent light
coherent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1236878A
Other languages
Japanese (ja)
Other versions
JPS5549767B2 (en
Inventor
Masakata Minami
Kazuaki Kimura
Tomohide Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1236878A priority Critical patent/JPS54105968A/en
Publication of JPS54105968A publication Critical patent/JPS54105968A/en
Publication of JPS5549767B2 publication Critical patent/JPS5549767B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To ensure the facilitated decision of the defect by irradiating both the coherent light and the incoherent light from the lower part of the tested pattern with the same optical axis and giving the Fourier conversion only to the transmitted coherent light to then piling these light.
CONSTITUTION: Tested pattern 2 such as the IC mask or the like is mounted on mobile stage 1, and both the coherent light and the incoherent light are irradiated from the lower part with the same optical axis. In other words, the red coherent light is generated from light source 3 which generates the He.Ne laser beam, and at the same time the incoherent light is caused from white light source 4. These light are reflected on half-mirror 6 after transmission through green filter 5. The light transmitted through pattern 2 is then led to object lens 8a of the microscope, and thus the information featuring the directivity among the coherent light is cut by Fourier conversion filter 9. Then the two transmitted light are picked up through pickup device 11 to be displayed on monitor 12 is the form of the image in which the red defect pattern overlaps the green pattern.
COPYRIGHT: (C)1979,JPO&Japio
JP1236878A 1978-02-08 1978-02-08 Defect corrector for pattern Granted JPS54105968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1236878A JPS54105968A (en) 1978-02-08 1978-02-08 Defect corrector for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1236878A JPS54105968A (en) 1978-02-08 1978-02-08 Defect corrector for pattern

Publications (2)

Publication Number Publication Date
JPS54105968A true JPS54105968A (en) 1979-08-20
JPS5549767B2 JPS5549767B2 (en) 1980-12-13

Family

ID=11803317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1236878A Granted JPS54105968A (en) 1978-02-08 1978-02-08 Defect corrector for pattern

Country Status (1)

Country Link
JP (1) JPS54105968A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111227A (en) * 1980-02-08 1981-09-02 Hitachi Ltd Laser working device with projection method using iris diaphragm
JPS56146223A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Method of machining film with laser beam
JPS60207335A (en) * 1984-03-31 1985-10-18 Dainippon Printing Co Ltd Pattern correcting method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111227A (en) * 1980-02-08 1981-09-02 Hitachi Ltd Laser working device with projection method using iris diaphragm
JPS625335B2 (en) * 1980-02-08 1987-02-04 Hitachi Ltd
JPS56146223A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Method of machining film with laser beam
JPS6041452B2 (en) * 1980-04-16 1985-09-17 株式会社日立製作所 Film processing method using laser beam
JPS60207335A (en) * 1984-03-31 1985-10-18 Dainippon Printing Co Ltd Pattern correcting method

Also Published As

Publication number Publication date
JPS5549767B2 (en) 1980-12-13

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