JPS5725297A - Laser working apparatus - Google Patents

Laser working apparatus

Info

Publication number
JPS5725297A
JPS5725297A JP10034880A JP10034880A JPS5725297A JP S5725297 A JPS5725297 A JP S5725297A JP 10034880 A JP10034880 A JP 10034880A JP 10034880 A JP10034880 A JP 10034880A JP S5725297 A JPS5725297 A JP S5725297A
Authority
JP
Japan
Prior art keywords
working
lens
subject
observing
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10034880A
Other languages
Japanese (ja)
Inventor
Takeji Harada
Yasuo Tateishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10034880A priority Critical patent/JPS5725297A/en
Publication of JPS5725297A publication Critical patent/JPS5725297A/en
Pending legal-status Critical Current

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  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To shorten the length of optical path from a working lens to an observing device and to sufficiently enlarge the angle of visual field, by placing a system from the working lens including the optical source of an observing beam to the observing device, such as television camera, etc., in an optical unit and by moving the unit in parallel to the working face of a sorking subject. CONSTITUTION:A laser beam is generated by an oscillator 1 and totally reflected by a dichroic mirror 3, and then, the beam irradiated to a prescribed position of a subject 7 to be worked through la working lens 6. On the other hand, an observing beam is generated at an optical source 8 and reflected by a translucent mirror 10, and then the beam illuminates said subject 7 through the secondary objective lens 11 of a television camera 15, the mirror 3 and the lens 6. The reflected light of the observing beam from the subject reaches the mirror 10 and enters into the camera 15 through a focusing mirror 13 and a pickup lens 14 to observe the working condition. The system from the lens 6 to the camera 15 and the optical source 8 are put in an optical unit 16, and, when scanning the laser beam and observing beam on a plural number of positions of the working subject 7, the unit 16 is moved almost in parallel to the working face of the working subject 7.
JP10034880A 1980-07-22 1980-07-22 Laser working apparatus Pending JPS5725297A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10034880A JPS5725297A (en) 1980-07-22 1980-07-22 Laser working apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10034880A JPS5725297A (en) 1980-07-22 1980-07-22 Laser working apparatus

Publications (1)

Publication Number Publication Date
JPS5725297A true JPS5725297A (en) 1982-02-10

Family

ID=14271594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10034880A Pending JPS5725297A (en) 1980-07-22 1980-07-22 Laser working apparatus

Country Status (1)

Country Link
JP (1) JPS5725297A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995012472A1 (en) * 1993-11-01 1995-05-11 Naiman Charles S System and assemblage for producing microtexturized substrates and implants

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995012472A1 (en) * 1993-11-01 1995-05-11 Naiman Charles S System and assemblage for producing microtexturized substrates and implants
US5607607A (en) * 1993-11-01 1997-03-04 Naiman; Charles S. System and assemblage for producing microtexturized substratesand implants
US5645740A (en) * 1993-11-01 1997-07-08 Naiman; Charles S. System and assemblage for producing microtexturized substrates and implants

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