JPS5788044A - Manufacture of glass mask - Google Patents

Manufacture of glass mask

Info

Publication number
JPS5788044A
JPS5788044A JP16407580A JP16407580A JPS5788044A JP S5788044 A JPS5788044 A JP S5788044A JP 16407580 A JP16407580 A JP 16407580A JP 16407580 A JP16407580 A JP 16407580A JP S5788044 A JPS5788044 A JP S5788044A
Authority
JP
Japan
Prior art keywords
substrate
metallic layer
manufacture
layer
type semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16407580A
Other languages
Japanese (ja)
Other versions
JPS6240309B2 (en
Inventor
Kaname Miyazawa
Yoshihiro Ono
Kazuo Ikegami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP16407580A priority Critical patent/JPS5788044A/en
Publication of JPS5788044A publication Critical patent/JPS5788044A/en
Publication of JPS6240309B2 publication Critical patent/JPS6240309B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE: To obtain a pinhole-free metallic thin film with high adhesion by coating an n-type semiconductor formed on a glass substrate with a metallic layer in a prescribed thickness and photoetching the metallic layer.
CONSTITUTION: An n-type semiconductor layer of SnO2, In2O3, TiO2, ZnO or PbO or doped with an impurity to these materials as required is formed on a transparent glass substrate. After washing the substrate having the semiconductor layer, a metallic layer having ≥300Å thickness is formed on the substrate by electroless plating. The substrate thus metallized is patternwise exposed directly through a negative film and etched.
COPYRIGHT: (C)1982,JPO&Japio
JP16407580A 1980-11-21 1980-11-21 Manufacture of glass mask Granted JPS5788044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16407580A JPS5788044A (en) 1980-11-21 1980-11-21 Manufacture of glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16407580A JPS5788044A (en) 1980-11-21 1980-11-21 Manufacture of glass mask

Publications (2)

Publication Number Publication Date
JPS5788044A true JPS5788044A (en) 1982-06-01
JPS6240309B2 JPS6240309B2 (en) 1987-08-27

Family

ID=15786297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16407580A Granted JPS5788044A (en) 1980-11-21 1980-11-21 Manufacture of glass mask

Country Status (1)

Country Link
JP (1) JPS5788044A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6027624A (en) * 1983-07-22 1985-02-12 Toyota Motor Corp Window glass shielding electromagnetic radiation
JPS6027623A (en) * 1983-07-22 1985-02-12 Toyota Motor Corp Window glass shielding electromagnetic radiation

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6027624A (en) * 1983-07-22 1985-02-12 Toyota Motor Corp Window glass shielding electromagnetic radiation
JPS6027623A (en) * 1983-07-22 1985-02-12 Toyota Motor Corp Window glass shielding electromagnetic radiation
JPH0433749B2 (en) * 1983-07-22 1992-06-03 Toyota Motor Co Ltd

Also Published As

Publication number Publication date
JPS6240309B2 (en) 1987-08-27

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