JPS5259579A - Photo etching method of semiconductor substrate - Google Patents

Photo etching method of semiconductor substrate

Info

Publication number
JPS5259579A
JPS5259579A JP50135491A JP13549175A JPS5259579A JP S5259579 A JPS5259579 A JP S5259579A JP 50135491 A JP50135491 A JP 50135491A JP 13549175 A JP13549175 A JP 13549175A JP S5259579 A JPS5259579 A JP S5259579A
Authority
JP
Japan
Prior art keywords
photo etching
semiconductor substrate
etching method
photo
pigments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50135491A
Other languages
Japanese (ja)
Inventor
Hiroo Naganuma
Makoto Okabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP50135491A priority Critical patent/JPS5259579A/en
Publication of JPS5259579A publication Critical patent/JPS5259579A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To perform fine photo etching at high accuracy by carrying out photo etching through deposition of a photo sensitive layer by way of an adhesion accelerator layer added with pigments having light shading characteristics.
JP50135491A 1975-11-11 1975-11-11 Photo etching method of semiconductor substrate Pending JPS5259579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50135491A JPS5259579A (en) 1975-11-11 1975-11-11 Photo etching method of semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50135491A JPS5259579A (en) 1975-11-11 1975-11-11 Photo etching method of semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS5259579A true JPS5259579A (en) 1977-05-17

Family

ID=15152965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50135491A Pending JPS5259579A (en) 1975-11-11 1975-11-11 Photo etching method of semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5259579A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933827A (en) * 1982-08-19 1984-02-23 Toshiba Corp Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933827A (en) * 1982-08-19 1984-02-23 Toshiba Corp Manufacture of semiconductor device

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