JPS5785048A - Exposed photosensitive diazo film for making screen plate - Google Patents

Exposed photosensitive diazo film for making screen plate

Info

Publication number
JPS5785048A
JPS5785048A JP16223080A JP16223080A JPS5785048A JP S5785048 A JPS5785048 A JP S5785048A JP 16223080 A JP16223080 A JP 16223080A JP 16223080 A JP16223080 A JP 16223080A JP S5785048 A JPS5785048 A JP S5785048A
Authority
JP
Japan
Prior art keywords
diazo compound
screen plate
layers
emulsion
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16223080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259293B2 (enrdf_load_stackoverflow
Inventor
Tetsuo Ishihara
Keiji Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP16223080A priority Critical patent/JPS5785048A/ja
Publication of JPS5785048A publication Critical patent/JPS5785048A/ja
Publication of JPS6259293B2 publication Critical patent/JPS6259293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16223080A 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate Granted JPS5785048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16223080A JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16223080A JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Publications (2)

Publication Number Publication Date
JPS5785048A true JPS5785048A (en) 1982-05-27
JPS6259293B2 JPS6259293B2 (enrdf_load_stackoverflow) 1987-12-10

Family

ID=15750438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16223080A Granted JPS5785048A (en) 1980-11-17 1980-11-17 Exposed photosensitive diazo film for making screen plate

Country Status (1)

Country Link
JP (1) JPS5785048A (enrdf_load_stackoverflow)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108538A (ja) * 1981-12-23 1983-06-28 Nippon Kankoushi Kogyo Kk 捺染用積層感光性樹脂フイルム
JPS59102228A (ja) * 1982-12-06 1984-06-13 Toray Ind Inc 感光性樹脂版材
JPS59216137A (ja) * 1983-05-24 1984-12-06 Daicel Chem Ind Ltd プラスチツクフイルム塗布用感光性エマルジヨン
JPS6117142A (ja) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol スクリーン製版用感光性材料
JPS61124690A (ja) * 1984-11-14 1986-06-12 フエルト・リユーシユ・アクチエンゲゼルシヤフト スクリーン捺染ドラムのためのスクリーン捺染クロスを造るための方法および装置
JPS61501596A (ja) * 1984-03-02 1986-07-31 セリコル　グル−プ　リミテツド スクリ−ン印刷用組成物
WO1987003706A3 (en) * 1985-12-05 1987-09-11 Vickers Plc Improvements in or relating to radiation sensitive devices
JPS63297040A (ja) * 1987-05-29 1988-12-05 Process Rabo Micron:Kk スクリ−ン印刷用ｐｓ版の製造方法及び装置
JPS6478248A (en) * 1987-09-18 1989-03-23 Shinetsu Chemical Co Photosensitive resin composition for screen printing
JPS6480943A (en) * 1987-09-22 1989-03-27 Shinetsu Chemical Co Aqueous dispersion of photosensitive resin for screen printing
JPH01246548A (ja) * 1988-03-29 1989-10-02 Nobukatsu Isato スクリーン印刷によるセラミック品への凸画線，模様の印刷方法
JPH036565A (ja) * 1989-06-02 1991-01-14 Goou Kagaku Kogyo Kk スクリーン製版用感光性樹脂組成物
KR100947372B1 (ko) * 2009-06-16 2010-03-15 주식회사 태영테크폴 스크린 제판용 고성능 일액형 감광유제 및 이를 이용한 평판 스크린 제조방법
JP2025026431A (ja) * 2023-08-09 2025-02-21 ミタニマイクロニクス株式会社 ドライフィルム積層体、スクリーンマスク、及びスクリーンマスクの製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003077215A2 (en) 2002-03-08 2003-09-18 Glen Research Corporation Fluorescent nitrogenous base and nucleosides incorporating same

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108538A (ja) * 1981-12-23 1983-06-28 Nippon Kankoushi Kogyo Kk 捺染用積層感光性樹脂フイルム
JPS59102228A (ja) * 1982-12-06 1984-06-13 Toray Ind Inc 感光性樹脂版材
JPS59216137A (ja) * 1983-05-24 1984-12-06 Daicel Chem Ind Ltd プラスチツクフイルム塗布用感光性エマルジヨン
JPS61501596A (ja) * 1984-03-02 1986-07-31 セリコル　グル−プ　リミテツド スクリ−ン印刷用組成物
JPS6117142A (ja) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol スクリーン製版用感光性材料
JPS61124690A (ja) * 1984-11-14 1986-06-12 フエルト・リユーシユ・アクチエンゲゼルシヤフト スクリーン捺染ドラムのためのスクリーン捺染クロスを造るための方法および装置
WO1987003706A3 (en) * 1985-12-05 1987-09-11 Vickers Plc Improvements in or relating to radiation sensitive devices
JPS63297040A (ja) * 1987-05-29 1988-12-05 Process Rabo Micron:Kk スクリ−ン印刷用ｐｓ版の製造方法及び装置
JPS6478248A (en) * 1987-09-18 1989-03-23 Shinetsu Chemical Co Photosensitive resin composition for screen printing
JPS6480943A (en) * 1987-09-22 1989-03-27 Shinetsu Chemical Co Aqueous dispersion of photosensitive resin for screen printing
JPH01246548A (ja) * 1988-03-29 1989-10-02 Nobukatsu Isato スクリーン印刷によるセラミック品への凸画線，模様の印刷方法
JPH036565A (ja) * 1989-06-02 1991-01-14 Goou Kagaku Kogyo Kk スクリーン製版用感光性樹脂組成物
KR100947372B1 (ko) * 2009-06-16 2010-03-15 주식회사 태영테크폴 스크린 제판용 고성능 일액형 감광유제 및 이를 이용한 평판 스크린 제조방법
JP2025026431A (ja) * 2023-08-09 2025-02-21 ミタニマイクロニクス株式会社 ドライフィルム積層体、スクリーンマスク、及びスクリーンマスクの製造方法

Also Published As

Publication number Publication date
JPS6259293B2 (enrdf_load_stackoverflow) 1987-12-10

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