JPS5783030A - Exposure of electron beam - Google Patents

Exposure of electron beam

Info

Publication number
JPS5783030A
JPS5783030A JP15843980A JP15843980A JPS5783030A JP S5783030 A JPS5783030 A JP S5783030A JP 15843980 A JP15843980 A JP 15843980A JP 15843980 A JP15843980 A JP 15843980A JP S5783030 A JPS5783030 A JP S5783030A
Authority
JP
Japan
Prior art keywords
rectangular
exposure
lens
slit
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15843980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6229893B2 (fr
Inventor
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15843980A priority Critical patent/JPS5783030A/ja
Publication of JPS5783030A publication Critical patent/JPS5783030A/ja
Publication of JPS6229893B2 publication Critical patent/JPS6229893B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP15843980A 1980-11-11 1980-11-11 Exposure of electron beam Granted JPS5783030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15843980A JPS5783030A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15843980A JPS5783030A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Publications (2)

Publication Number Publication Date
JPS5783030A true JPS5783030A (en) 1982-05-24
JPS6229893B2 JPS6229893B2 (fr) 1987-06-29

Family

ID=15671786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15843980A Granted JPS5783030A (en) 1980-11-11 1980-11-11 Exposure of electron beam

Country Status (1)

Country Link
JP (1) JPS5783030A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122525A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Dividing method for drawing figure in electron beam exposure apparatus
JPS57208133A (en) * 1981-06-17 1982-12-21 Jeol Ltd Electron-beam exposure method
JPS5957431A (ja) * 1982-09-27 1984-04-03 Fujitsu Ltd 電子ビ−ム露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366174U (fr) * 1976-11-08 1978-06-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366174U (fr) * 1976-11-08 1978-06-03

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57122525A (en) * 1981-01-23 1982-07-30 Nippon Telegr & Teleph Corp <Ntt> Dividing method for drawing figure in electron beam exposure apparatus
JPH0371765B2 (fr) * 1981-01-23 1991-11-14 Nippon Denshin Denwa Kk
JPS57208133A (en) * 1981-06-17 1982-12-21 Jeol Ltd Electron-beam exposure method
JPS5957431A (ja) * 1982-09-27 1984-04-03 Fujitsu Ltd 電子ビ−ム露光装置
JPH0336299B2 (fr) * 1982-09-27 1991-05-31 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS6229893B2 (fr) 1987-06-29

Similar Documents

Publication Publication Date Title
US4151422A (en) Electron beam exposure method
US4136285A (en) Method for irradiating a specimen by corpuscular-beam radiation
JPS52143776A (en) Electron beam exposure apparatus
JPS5783030A (en) Exposure of electron beam
GB1381082A (en) Method and apparatus for selectively exposing a photosensitive surface
JPS5489579A (en) Electron ray exposure system
JPS5587433A (en) Electron beam exposure device
JPS5772327A (en) Formation of resist pattern
JPS5360178A (en) Target for focusing of electron beam
JPS5528252A (en) Method of manufacturing control electrode of flat plate- like picture display unit
JPS52130570A (en) Electron beam exposing device
JPS52141180A (en) Electron beam exposure apparatus
JPS5413735A (en) Projection type picture tube
JPS57208133A (en) Electron-beam exposure method
JPS52119079A (en) Electron beam exposure
JPS5461878A (en) Electron beam exposure apparatus
JPS53132269A (en) Electron beam pattern projector
JPS5786815A (en) Photoscanner
JPS56104439A (en) Electron beam exposing method
JPS5515212A (en) Electronic beam exposure apparatus
JPS6235263B2 (fr)
JPS5454581A (en) Electron beam exposure apparatus
JPS5279662A (en) Electron beam exposure device
JPS5357764A (en) Electron beam exposure apparatus
JPS56157027A (en) Electron beam projector