JPS57122525A - Dividing method for drawing figure in electron beam exposure apparatus - Google Patents

Dividing method for drawing figure in electron beam exposure apparatus

Info

Publication number
JPS57122525A
JPS57122525A JP867881A JP867881A JPS57122525A JP S57122525 A JPS57122525 A JP S57122525A JP 867881 A JP867881 A JP 867881A JP 867881 A JP867881 A JP 867881A JP S57122525 A JPS57122525 A JP S57122525A
Authority
JP
Japan
Prior art keywords
size
registers
electron beam
width
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP867881A
Other languages
Japanese (ja)
Other versions
JPH0371765B2 (en
Inventor
Akinori Shibayama
Nobuo Shimazu
Akihira Fujinami
Haruo Yoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP867881A priority Critical patent/JPS57122525A/en
Publication of JPS57122525A publication Critical patent/JPS57122525A/en
Publication of JPH0371765B2 publication Critical patent/JPH0371765B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate the unsharpness of the end of an electron beam of an electron beam size variable exposure apparatus by dividing a figure into figure segments of the size capable of being solely emitted when a figure which is larger than the maximum size capable of being drawn by the beam is drawn and dividing the size of the figure into the figure segments larger than the predetermined minimum size. CONSTITUTION:There are provided figure height and width size registers 21, 22, electron beam height and width maximum size registers 23, 24, registers 25, 26 for setting the sum of the electron beam height and width minimum size plus previous maximum size of the beam not affected by the influence of an unsharpness, and registers 27, 28 for dividing the height and the width into desired size, and further registers 29-31 capable of selecting two inputs at the rear stages of the registers 21, 23, 25, 27, a register 32, a subtractor 33, an AND gate 34, digital comparators 35, 36, and a controller 37. A figure 40 to be drawn and to be divided is connected to the rear stages of the registers 22, 24, 26, 28, and a name register is controlled by the controller 37, and the figure 40 is divided into the size larger than the predetermined minimum size.
JP867881A 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus Granted JPS57122525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP867881A JPS57122525A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP867881A JPS57122525A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS57122525A true JPS57122525A (en) 1982-07-30
JPH0371765B2 JPH0371765B2 (en) 1991-11-14

Family

ID=11699580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP867881A Granted JPS57122525A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS57122525A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4878177A (en) * 1987-02-16 1989-10-31 Kabushiki Kaisha Toshiba Method for drawing a desired circuit pattern using charged particle beam

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5783030A (en) * 1980-11-11 1982-05-24 Fujitsu Ltd Exposure of electron beam
JPS57113221A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Apparatus for electron beam exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5783030A (en) * 1980-11-11 1982-05-24 Fujitsu Ltd Exposure of electron beam
JPS57113221A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Apparatus for electron beam exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4878177A (en) * 1987-02-16 1989-10-31 Kabushiki Kaisha Toshiba Method for drawing a desired circuit pattern using charged particle beam

Also Published As

Publication number Publication date
JPH0371765B2 (en) 1991-11-14

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