JPS57122526A - Dividing method for drawing figure in electron beam exposure apparatus - Google Patents

Dividing method for drawing figure in electron beam exposure apparatus

Info

Publication number
JPS57122526A
JPS57122526A JP867981A JP867981A JPS57122526A JP S57122526 A JPS57122526 A JP S57122526A JP 867981 A JP867981 A JP 867981A JP 867981 A JP867981 A JP 867981A JP S57122526 A JPS57122526 A JP S57122526A
Authority
JP
Japan
Prior art keywords
registers
exposure apparatus
height
electron beam
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP867981A
Other languages
Japanese (ja)
Other versions
JPS6250054B2 (en
Inventor
Akinori Shibayama
Nobuo Shimazu
Korehito Matsuda
Haruo Yoda
Susumu Ozasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP867981A priority Critical patent/JPS57122526A/en
Publication of JPS57122526A publication Critical patent/JPS57122526A/en
Publication of JPS6250054B2 publication Critical patent/JPS6250054B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate the unsharpness of the periphery of an electron beam of an electron beam size variable exposure apparatus by comparing a figure to be drawn with the maximum allowable size of the beam, comparing the area of the figure with the predetermined value, and dividing the figure with the two values. CONSTITUTION:An exposure apparatus is composed of a height direction division control circuit 1, a width direction division control circuit 2, registers 3-9, a digital multiplier 10, digital comparators 11-15, a comparator 16 with a register, a subtractor 17, a digital comparator 18, selectors 19, 20 with registers, and a controller 21. Thus, the maximum allowable width W0 and the height H0 are respectively applied to the registers 3, 6, and the figure width W1 and height H1 to be divided are respectively set in the registers 5, 8. The value of H1XW1=C is set in the register 9, and the figure width W and height H of the entire figure to be divided are respectively set in the registers 4, 7. In this manner, the dividing mode is determined, and a figure is drawn in accordance with this.
JP867981A 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus Granted JPS57122526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP867981A JPS57122526A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP867981A JPS57122526A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Publications (2)

Publication Number Publication Date
JPS57122526A true JPS57122526A (en) 1982-07-30
JPS6250054B2 JPS6250054B2 (en) 1987-10-22

Family

ID=11699609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP867981A Granted JPS57122526A (en) 1981-01-23 1981-01-23 Dividing method for drawing figure in electron beam exposure apparatus

Country Status (1)

Country Link
JP (1) JPS57122526A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229819A (en) * 1983-06-13 1984-12-24 Hitachi Ltd Electron beam patterning apparatus
JPS60198723A (en) * 1984-03-22 1985-10-08 Toshiba Corp Method and apparatus for preparing drawing data of electron-beam exposure device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59229819A (en) * 1983-06-13 1984-12-24 Hitachi Ltd Electron beam patterning apparatus
JPS60198723A (en) * 1984-03-22 1985-10-08 Toshiba Corp Method and apparatus for preparing drawing data of electron-beam exposure device

Also Published As

Publication number Publication date
JPS6250054B2 (en) 1987-10-22

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