JPS5752024A - Manufacture of transparent electrode substrate - Google Patents

Manufacture of transparent electrode substrate

Info

Publication number
JPS5752024A
JPS5752024A JP12780680A JP12780680A JPS5752024A JP S5752024 A JPS5752024 A JP S5752024A JP 12780680 A JP12780680 A JP 12780680A JP 12780680 A JP12780680 A JP 12780680A JP S5752024 A JPS5752024 A JP S5752024A
Authority
JP
Japan
Prior art keywords
transparent electrode
organic
electrode layer
organic material
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12780680A
Other languages
Japanese (ja)
Other versions
JPH0122607B2 (en
Inventor
Yoshimi Kamijo
Jun Nakanowatari
Kazutoshi Shimojo
Yoshizo Tashiro
Mitsuru Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP12780680A priority Critical patent/JPS5752024A/en
Publication of JPS5752024A publication Critical patent/JPS5752024A/en
Publication of JPH0122607B2 publication Critical patent/JPH0122607B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/245—Reinforcing conductive patterns made by printing techniques or by other techniques for applying conductive pastes, inks or powders; Reinforcing other conductive patterns by such techniques

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PURPOSE:To manufacture a transparent electrode substrate with which a liquid- crystal display device having high reliability is obtained, by using an organic material containing an organic metallic compound, changing into a metllic oxide by thermal decomposition, as etching resist. CONSTITUTION:Over the one entire surface of a transparent glass substrate 1, an indium oxide transparent electrode layer 2a is vacuum-deposited. Then, paste of a dispersedly mixed organic compound, such as an organic silicon compound, and cellulose binder and an organic solvent, which can be printed through a screen, is used and applied onto the transparent electrode layer 2a in a prescribed shape by screen printing, and it is stuck by being dried to form an organic material film 3a containing the organic metallic compound. A solution of dilute hydrochloric acid, etc., is to remove a part except where the organic material film 3a is provided on the transparent electrode layer 2a by etching, thus forming a transparent electrode layer 2 in a prescribed shape. A baking treatment is performed at a temperatur lower than the fusion point of the glass substrate 1 to decompose the organic material film 3a thermally, thereby forming a transparent insulating film 3. Lastly, the entire surface of the insulating film 3 is coated with a transparent insulating film 4 of metallic oxide.
JP12780680A 1980-09-13 1980-09-13 Manufacture of transparent electrode substrate Granted JPS5752024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12780680A JPS5752024A (en) 1980-09-13 1980-09-13 Manufacture of transparent electrode substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12780680A JPS5752024A (en) 1980-09-13 1980-09-13 Manufacture of transparent electrode substrate

Publications (2)

Publication Number Publication Date
JPS5752024A true JPS5752024A (en) 1982-03-27
JPH0122607B2 JPH0122607B2 (en) 1989-04-27

Family

ID=14969132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12780680A Granted JPS5752024A (en) 1980-09-13 1980-09-13 Manufacture of transparent electrode substrate

Country Status (1)

Country Link
JP (1) JPS5752024A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS606943A (en) * 1983-06-25 1985-01-14 Futaba Corp Photosensitive composition and formation of micropattern by using it
JPS61184532A (en) * 1985-02-13 1986-08-18 Tokyo Denshi Kagaku Kk Photosensitive comosition
JPH0232866A (en) * 1988-07-22 1990-02-02 Matsushita Electric Ind Co Ltd Manufacture of thermal head
JP2007116029A (en) * 2005-10-24 2007-05-10 Mitsubishi Electric Corp Wiring board, method for manufacturing same, and display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS606943A (en) * 1983-06-25 1985-01-14 Futaba Corp Photosensitive composition and formation of micropattern by using it
JPS61184532A (en) * 1985-02-13 1986-08-18 Tokyo Denshi Kagaku Kk Photosensitive comosition
JPH0232866A (en) * 1988-07-22 1990-02-02 Matsushita Electric Ind Co Ltd Manufacture of thermal head
JP2007116029A (en) * 2005-10-24 2007-05-10 Mitsubishi Electric Corp Wiring board, method for manufacturing same, and display device

Also Published As

Publication number Publication date
JPH0122607B2 (en) 1989-04-27

Similar Documents

Publication Publication Date Title
JPS5752024A (en) Manufacture of transparent electrode substrate
JPS54103694A (en) Production of transparent conductive film patterns of liquid crystal panel
JPS5238947A (en) Electrochromic display device
JPS5560917A (en) Liquid crystal display device
JPS5455190A (en) Structure and production of thin film el element
JPS55157719A (en) Liquid crystal display panel
JPH01173041A (en) Pattern forming method
JPS561016A (en) Production of liquid crystal display device
JPS5425493A (en) Manufacture of transparent conductive film
JPS61243613A (en) Formation of transparent conducting layer
JPS5350969A (en) Manufacture of plasma display panel
JPS5622410A (en) Liquid crystal display panel
JPS54133152A (en) Liquid crystal cell
JPS6227154B2 (en)
JPS5450898A (en) Patterning of indium oxide transparent conductive films
JPS5680020A (en) Liquid crystal display device
JPS5284760A (en) Formation of electrode for liquid crystal display element
JPS54104490A (en) Electrochromic display device
JPS5487245A (en) Production of electric color deviloping display element
JPS6465523A (en) Manufacture of liquid crystal display element
JPS54126557A (en) Electrochromic display element
JPS5525082A (en) Production of electrochromic display device
JPS5584916A (en) Electro-optic display panel of matrix type or the like and device thereof
JPS54152882A (en) Structure of thin film el element
JPS5734521A (en) Electrode substrate for liquid crystal display element and its production