JPS5455190A - Structure and production of thin film el element - Google Patents

Structure and production of thin film el element

Info

Publication number
JPS5455190A
JPS5455190A JP12208477A JP12208477A JPS5455190A JP S5455190 A JPS5455190 A JP S5455190A JP 12208477 A JP12208477 A JP 12208477A JP 12208477 A JP12208477 A JP 12208477A JP S5455190 A JPS5455190 A JP S5455190A
Authority
JP
Japan
Prior art keywords
dielectric layer
electrodes
film
sno
entire surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12208477A
Other languages
Japanese (ja)
Other versions
JPS5824915B2 (en
Inventor
Hiroshi Kishishita
Yoshihiro Endo
Etsuo Mizukami
Kinichi Isaka
Jun Kawaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP52122084A priority Critical patent/JPS5824915B2/en
Priority to US05/884,475 priority patent/US4188565A/en
Priority to DE19782812592 priority patent/DE2812592A1/en
Priority to GB12701/78A priority patent/GB1602895A/en
Publication of JPS5455190A publication Critical patent/JPS5455190A/en
Publication of JPS5824915B2 publication Critical patent/JPS5824915B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To form a dielectric layer having high adhesiveness on transparent electrodes or glass substrates by letting binding force by atomic reaction between SnO2 or InO3 or glass substrates by the use of a Si3N4 film containing physically and chemically active oxygen components.
CONSTITUTION: A transparent electrode 11 composed of SnO2, In2O3 or other is deposited on a heat-resisting glass substrate 10 for panels and is photoetched to strip- form parallel matrix electrode structure. Next, a Si3N4 first dielectric layer 12 of the composite composition containing equivalent SiO2 of 0.1 to 10% is formed by sputtering over the entire surface, and a ZnS light emitting layer 13 is evaporated thereon. Thereafter, a second dielectric layer of the same composition or of Si3N4, Ta2O5, Y2O3, etc. is deposited thereafter, and the entire surface is convered with a protecting film 15 such as of Al2O3. After these, Al strip form back electrodes 16 are mounted on the film 15 by being intersected perpendicularly with the electrodes 11. Thereby, sufficient high electric fields may be applied to the ZnS light emitting layer 13 and light emission luminance is improved
COPYRIGHT: (C)1979,JPO&Japio
JP52122084A 1977-09-16 1977-10-11 Thin film EL element Expired JPS5824915B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP52122084A JPS5824915B2 (en) 1977-10-11 1977-10-11 Thin film EL element
US05/884,475 US4188565A (en) 1977-09-16 1978-03-08 Oxygen atom containing film for a thin-film electroluminescent element
DE19782812592 DE2812592A1 (en) 1977-09-16 1978-03-22 THIN-FILM ELECTROLUMINESCENT DISPLAY ELEMENT AND METHOD OF MANUFACTURING IT
GB12701/78A GB1602895A (en) 1977-09-16 1978-03-31 Thin-film electroluminescent element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52122084A JPS5824915B2 (en) 1977-10-11 1977-10-11 Thin film EL element

Publications (2)

Publication Number Publication Date
JPS5455190A true JPS5455190A (en) 1979-05-02
JPS5824915B2 JPS5824915B2 (en) 1983-05-24

Family

ID=14827249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52122084A Expired JPS5824915B2 (en) 1977-09-16 1977-10-11 Thin film EL element

Country Status (1)

Country Link
JP (1) JPS5824915B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154794A (en) * 1981-02-23 1982-09-24 Lohja Ab Oy Thin film electroluminescent structure
WO1984003992A1 (en) * 1983-03-31 1984-10-11 Matsushita Electric Ind Co Ltd Thin-film integrated device
JPS60202687A (en) * 1984-03-27 1985-10-14 日本電気株式会社 Thin film electroluminescent element
JPS622495A (en) * 1985-06-26 1987-01-08 ホ−ヤ株式会社 Manufacture of thin film el element

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0186026U (en) * 1987-11-27 1989-06-07

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444885A (en) * 1977-09-16 1979-04-09 Sharp Corp Structure and manufacture of thin film el element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444885A (en) * 1977-09-16 1979-04-09 Sharp Corp Structure and manufacture of thin film el element

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154794A (en) * 1981-02-23 1982-09-24 Lohja Ab Oy Thin film electroluminescent structure
JPH0158639B2 (en) * 1981-02-23 1989-12-12 Erukotoreedo Ag
WO1984003992A1 (en) * 1983-03-31 1984-10-11 Matsushita Electric Ind Co Ltd Thin-film integrated device
JPS60202687A (en) * 1984-03-27 1985-10-14 日本電気株式会社 Thin film electroluminescent element
JPS622495A (en) * 1985-06-26 1987-01-08 ホ−ヤ株式会社 Manufacture of thin film el element

Also Published As

Publication number Publication date
JPS5824915B2 (en) 1983-05-24

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