JPS5737835A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5737835A JPS5737835A JP11386880A JP11386880A JPS5737835A JP S5737835 A JPS5737835 A JP S5737835A JP 11386880 A JP11386880 A JP 11386880A JP 11386880 A JP11386880 A JP 11386880A JP S5737835 A JPS5737835 A JP S5737835A
- Authority
- JP
- Japan
- Prior art keywords
- film
- psg
- psg film
- resist
- nitriding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 4
- 238000005121 nitriding Methods 0.000 abstract 3
- 238000005530 etching Methods 0.000 abstract 2
- 239000007853 buffer solution Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11386880A JPS5737835A (en) | 1980-08-19 | 1980-08-19 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11386880A JPS5737835A (en) | 1980-08-19 | 1980-08-19 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5737835A true JPS5737835A (en) | 1982-03-02 |
| JPH0133932B2 JPH0133932B2 (enrdf_load_stackoverflow) | 1989-07-17 |
Family
ID=14623110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11386880A Granted JPS5737835A (en) | 1980-08-19 | 1980-08-19 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5737835A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147122A (ja) * | 1982-02-26 | 1983-09-01 | Fujitsu Ltd | 化合物半導体装置の製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52117554A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Manufacturing method of semiconductor device |
| JPS54583A (en) * | 1977-06-03 | 1979-01-05 | Hitachi Ltd | Production of mis semiconductor device |
-
1980
- 1980-08-19 JP JP11386880A patent/JPS5737835A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52117554A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Manufacturing method of semiconductor device |
| JPS54583A (en) * | 1977-06-03 | 1979-01-05 | Hitachi Ltd | Production of mis semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147122A (ja) * | 1982-02-26 | 1983-09-01 | Fujitsu Ltd | 化合物半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0133932B2 (enrdf_load_stackoverflow) | 1989-07-17 |
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