JPS5728372A - Manufacture of semiconductor light emitting device - Google Patents
Manufacture of semiconductor light emitting deviceInfo
- Publication number
- JPS5728372A JPS5728372A JP10303380A JP10303380A JPS5728372A JP S5728372 A JPS5728372 A JP S5728372A JP 10303380 A JP10303380 A JP 10303380A JP 10303380 A JP10303380 A JP 10303380A JP S5728372 A JPS5728372 A JP S5728372A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- grown
- type
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
PURPOSE:To obtain the device emitting light at the substrate side while eliminating the need for a buffer layer, and to simplify structure by a method wherein the surface of the substrate is etched, and a direct carrier confining layer, an energy gap thereof is larger than the substrate, is grown on the surface. CONSTITUTION:When the carrier confining layer is grown in an epitaxial shape through a gaseous-phase reaction, HCl gas is worked on the surface of the N type GaAs substrate 1 first and the surface is etched, and a surface transforming layer generated during heating in a reaction chamber is removed previously. The gas is changed into H2, AsCl3, AlCl3, etc., and the P type CaAlAs carrier confining layer 3 is grown on the exposed surface 2. When the confining layer is grown in a liquid phase, a Ga solution in which N type GaAs is saturated is worked to the substrate 1, a transformed layer formed on the surface is melted back, the solution is changed into a Ga solution in which P type GaAlAs is supersaturated, and the P type GaAl As layer 3 is grown. An electrode 4 is attached to one part of the surface of the layer 3 and an electrode 5 collectively to the back of the substrate 1 respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303380A JPS5728372A (en) | 1980-07-29 | 1980-07-29 | Manufacture of semiconductor light emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10303380A JPS5728372A (en) | 1980-07-29 | 1980-07-29 | Manufacture of semiconductor light emitting device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5728372A true JPS5728372A (en) | 1982-02-16 |
Family
ID=14343339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10303380A Pending JPS5728372A (en) | 1980-07-29 | 1980-07-29 | Manufacture of semiconductor light emitting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5728372A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61154123A (en) * | 1984-12-27 | 1986-07-12 | Showa Denko Kk | Liquid-phase epitaxial growth method |
JPS63123835A (en) * | 1987-10-22 | 1988-05-27 | Union:Kk | Glass bead of high refractive index |
-
1980
- 1980-07-29 JP JP10303380A patent/JPS5728372A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61154123A (en) * | 1984-12-27 | 1986-07-12 | Showa Denko Kk | Liquid-phase epitaxial growth method |
JPS63123835A (en) * | 1987-10-22 | 1988-05-27 | Union:Kk | Glass bead of high refractive index |
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