JPS57200598A - Plating apparatus - Google Patents
Plating apparatusInfo
- Publication number
- JPS57200598A JPS57200598A JP56084567A JP8456781A JPS57200598A JP S57200598 A JPS57200598 A JP S57200598A JP 56084567 A JP56084567 A JP 56084567A JP 8456781 A JP8456781 A JP 8456781A JP S57200598 A JPS57200598 A JP S57200598A
- Authority
- JP
- Japan
- Prior art keywords
- work
- plating solution
- anode
- held
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title abstract 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56084567A JPS57200598A (en) | 1981-06-02 | 1981-06-02 | Plating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56084567A JPS57200598A (en) | 1981-06-02 | 1981-06-02 | Plating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57200598A true JPS57200598A (en) | 1982-12-08 |
JPS6347794B2 JPS6347794B2 (ja) | 1988-09-26 |
Family
ID=13834234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56084567A Granted JPS57200598A (en) | 1981-06-02 | 1981-06-02 | Plating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57200598A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60132465U (ja) * | 1984-02-14 | 1985-09-04 | 上村工業株式会社 | 板状ワ−クの処理装置 |
JPS6237390A (ja) * | 1985-08-09 | 1987-02-18 | Nippon Denso Co Ltd | 部分めつき装置 |
JPH01290792A (ja) * | 1988-05-17 | 1989-11-22 | Katayama Tokushu Kogyo Kk | 金属多孔体及びその製造方法並びに製造装置 |
JPH0393255A (ja) * | 1989-09-05 | 1991-04-18 | Hitachi Cable Ltd | リードフレームの両面部分めっき方法および装置 |
JP2003321796A (ja) * | 2002-04-30 | 2003-11-14 | Nitto Denko Corp | めっき装置およびそれを用いた配線基板の製造方法 |
-
1981
- 1981-06-02 JP JP56084567A patent/JPS57200598A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60132465U (ja) * | 1984-02-14 | 1985-09-04 | 上村工業株式会社 | 板状ワ−クの処理装置 |
JPS644844Y2 (ja) * | 1984-02-14 | 1989-02-07 | ||
JPS6237390A (ja) * | 1985-08-09 | 1987-02-18 | Nippon Denso Co Ltd | 部分めつき装置 |
JPH01290792A (ja) * | 1988-05-17 | 1989-11-22 | Katayama Tokushu Kogyo Kk | 金属多孔体及びその製造方法並びに製造装置 |
JPH0571676B2 (ja) * | 1988-05-17 | 1993-10-07 | Katayama Tokushu Kogyo Kk | |
JPH0393255A (ja) * | 1989-09-05 | 1991-04-18 | Hitachi Cable Ltd | リードフレームの両面部分めっき方法および装置 |
JP2003321796A (ja) * | 2002-04-30 | 2003-11-14 | Nitto Denko Corp | めっき装置およびそれを用いた配線基板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6347794B2 (ja) | 1988-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR930010062B1 (ko) | 수평 안내 회로 기판내에 천공된 구멍을 청소, 활성화, 금속 피복하는 방법 및 장치 | |
ZA877007B (en) | Selective metallization process,additive method for manufactured printed circuit boards,and composition for use therein | |
ES8404769A1 (es) | Metodo para metalizar una superficie no metalica por chapado electrolitico | |
US4072777A (en) | Method and apparatus for forming a uniform solder wave | |
JPS57200598A (en) | Plating apparatus | |
JPS57200591A (en) | Plating apparatus | |
FR2381567A1 (fr) | Dispositif d'electrolyse par projection | |
US4409071A (en) | Masking for selective electroplating jet method | |
JPS54100955A (en) | Solder equipment | |
JPS56119792A (en) | Electroplating method | |
JPS6473696A (en) | Printed-circuit board | |
CH616178A5 (en) | Plating appliance for thin plates, foils or similar sheet-like material. | |
JPS5445632A (en) | Method and appatatus for one surface plating in molten metal bath | |
DE3804070C2 (ja) | ||
JPS5547394A (en) | Continuous plating unit | |
JPS6467995A (en) | Manufacture of printed circuit board with side face electrode | |
JPS5638493A (en) | Through-hole plating method and apparatus of print wiring substrate plate | |
JPS6482598A (en) | Copper plating method for printed board | |
JPS54160526A (en) | Manufacture of printing distributing board embedded with metal core having contact plug | |
Jawitz et al. | Operation of Copper Pyrophosphate Circuit-Board Plating Baths at High Additive Concentrations | |
EP0105606A3 (en) | High throughput, high uniformity field emission devices | |
JPS56150833A (en) | Method for application of solder | |
JPH049500A (ja) | 電気めっき装置 | |
JPS55161058A (en) | Manufacture of continuous type one side hot dipping steel plate and its apparatus | |
JPS5411030A (en) | Copper plating method for carbon powder |