JPS57200299A - Separating method of whisker grown in void of raw material - Google Patents
Separating method of whisker grown in void of raw materialInfo
- Publication number
- JPS57200299A JPS57200299A JP11472281A JP11472281A JPS57200299A JP S57200299 A JPS57200299 A JP S57200299A JP 11472281 A JP11472281 A JP 11472281A JP 11472281 A JP11472281 A JP 11472281A JP S57200299 A JPS57200299 A JP S57200299A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- whiskers
- gas
- organic liquid
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
- C01B21/0685—Preparation by carboreductive nitridation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To separate whiskers grown efficiently in a mixed state in a raw material effectively from the raw material, by dispersing a raw material in which the whiskers are grown in voids with a mixture of a hydrophobic organic liquid with water.
CONSTITUTION: A nonoxidizing gas except N2 and a nitriding gas is passed through a carbonized material of chaff kept at a high temperature to grow silicon carbide whiskers on the inside and the outside thereof. The carbonized material is then kept at a high temperature, and N2 gas or NH3 gas is passed through the material to grow silicon nitride whiskers on the inside and the outside. During this time, the carbon plays a role in the shape retention of the chaff. The raw material taken out of the furnace contains the mutually entangled and joined whiskers, is poured in water and loosened with gentle stirring. A hydrophobic organic liquid, e.g. kerosine, is added thereto, and the mixture is stirred and allowed to stand. The whiskers remain in the water side at the bottom, and the raw material is transferred to the organic liquid side and separated.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11472281A JPS6037079B2 (en) | 1981-07-21 | 1981-07-21 | Separation method for whiskers grown in voids in raw materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11472281A JPS6037079B2 (en) | 1981-07-21 | 1981-07-21 | Separation method for whiskers grown in voids in raw materials |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8309581A Division JPS6037078B2 (en) | 1981-05-29 | 1981-05-29 | Method for manufacturing silicon nitride whiskers |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57200299A true JPS57200299A (en) | 1982-12-08 |
JPS6037079B2 JPS6037079B2 (en) | 1985-08-23 |
Family
ID=14644977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11472281A Expired JPS6037079B2 (en) | 1981-07-21 | 1981-07-21 | Separation method for whiskers grown in voids in raw materials |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6037079B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7166523B2 (en) * | 2000-08-10 | 2007-01-23 | Hoya Corporation | Silicon carbide and method of manufacturing the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020157932A1 (en) * | 2019-01-31 | 2020-08-06 | 富士通フロンテック株式会社 | Self-payment system, management device, terminal management method, and program |
-
1981
- 1981-07-21 JP JP11472281A patent/JPS6037079B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7166523B2 (en) * | 2000-08-10 | 2007-01-23 | Hoya Corporation | Silicon carbide and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6037079B2 (en) | 1985-08-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57200299A (en) | Separating method of whisker grown in void of raw material | |
BE901114A (en) | METHOD FOR MANUFACTURING SILICON FROM QUARTZ IN THE FORM OF RAW MATERIALS IN A LOW ELECTRIC FURNACE. | |
JPS54124898A (en) | Preparation of silicon nitride | |
JPS57111300A (en) | Preparation of ceramic whisker | |
JPS5345679A (en) | Pulling-up apparatus for sillicon single crystal | |
JPS5632397A (en) | Silicon single crystal pulling apparatus | |
JPS5820799A (en) | Preparation of silicon carbide whisker | |
JPS5645890A (en) | Crystal growing apparatus | |
JPS5246398A (en) | Method for continuous production of beta-sic | |
JPS56104799A (en) | Production of si single crystal and device therefor | |
JPS5722199A (en) | Method for growing single crystal | |
JPS56100115A (en) | Manufacture of silicon nitride whisker | |
JPS52138095A (en) | Growth of sapphire single crystal | |
JPS6451400A (en) | Production of silicon carbide whisker | |
JPS55140800A (en) | Crucible for crystal growing crucible device | |
JPS54141389A (en) | Crucible used in crystal growing device, manufacture of said crucible and crystal growing method using said crucible | |
JPS5717494A (en) | Manufacture of single crystal | |
Parent-Simonin et al. | Abnormal Surface Graphitisation of White Cast Irons.(Summary) | |
JPS55140797A (en) | Single crystal manufacturing device | |
JPS5756399A (en) | Manufacture of single crystal of compound with high decomposition pressure | |
JPS55162426A (en) | Manufacture of alpha-type hemihydrate gypsum | |
PILIANKEVICH et al. | Electron microscopy study of the dislocation mechanism of plastic deformation of alpha-SiC(Elektronno-mikroskopicheskoe issledovanie dislokatsionnogo mekhanizma plasticheskoi deformatsii alfa-SiC) | |
JPS5618000A (en) | Vapor phase growing method for 3-5 group compound semiconductor | |
Neerland | Silicon Carbide Production by the Acheson Process: a Critical Literature Review | |
RU95117198A (en) | METHOD FOR PRODUCING REFRACTORY MATERIAL BASED ON SILICON AND SILICON CARBIDE |