JPS57194530A - Positioning of photomask substrate - Google Patents
Positioning of photomask substrateInfo
- Publication number
- JPS57194530A JPS57194530A JP56079389A JP7938981A JPS57194530A JP S57194530 A JPS57194530 A JP S57194530A JP 56079389 A JP56079389 A JP 56079389A JP 7938981 A JP7938981 A JP 7938981A JP S57194530 A JPS57194530 A JP S57194530A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- mark
- detection
- matching mark
- grid line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 2
- 238000001514 detection method Methods 0.000 abstract 5
- 230000000007 visual effect Effects 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56079389A JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57194530A true JPS57194530A (en) | 1982-11-30 |
JPS6148252B2 JPS6148252B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-10-23 |
Family
ID=13688501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56079389A Granted JPS57194530A (en) | 1981-05-27 | 1981-05-27 | Positioning of photomask substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57194530A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1126507A3 (en) * | 2000-02-14 | 2002-07-24 | Shinko Electric Industries Co. Ltd. | Apparatus for positioning a thin plate |
-
1981
- 1981-05-27 JP JP56079389A patent/JPS57194530A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1126507A3 (en) * | 2000-02-14 | 2002-07-24 | Shinko Electric Industries Co. Ltd. | Apparatus for positioning a thin plate |
Also Published As
Publication number | Publication date |
---|---|
JPS6148252B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-10-23 |
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