JPS57194304A - Inspecting method for circuit pattern - Google Patents

Inspecting method for circuit pattern

Info

Publication number
JPS57194304A
JPS57194304A JP7922581A JP7922581A JPS57194304A JP S57194304 A JPS57194304 A JP S57194304A JP 7922581 A JP7922581 A JP 7922581A JP 7922581 A JP7922581 A JP 7922581A JP S57194304 A JPS57194304 A JP S57194304A
Authority
JP
Japan
Prior art keywords
directions
patterns
position deviation
signals
max
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7922581A
Other languages
English (en)
Other versions
JPH0160766B2 (ja
Inventor
Toshimitsu Hamada
Yasuhiko Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7922581A priority Critical patent/JPS57194304A/ja
Publication of JPS57194304A publication Critical patent/JPS57194304A/ja
Publication of JPH0160766B2 publication Critical patent/JPH0160766B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP7922581A 1981-05-27 1981-05-27 Inspecting method for circuit pattern Granted JPS57194304A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7922581A JPS57194304A (en) 1981-05-27 1981-05-27 Inspecting method for circuit pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7922581A JPS57194304A (en) 1981-05-27 1981-05-27 Inspecting method for circuit pattern

Publications (2)

Publication Number Publication Date
JPS57194304A true JPS57194304A (en) 1982-11-29
JPH0160766B2 JPH0160766B2 (ja) 1989-12-25

Family

ID=13683959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7922581A Granted JPS57194304A (en) 1981-05-27 1981-05-27 Inspecting method for circuit pattern

Country Status (1)

Country Link
JP (1) JPS57194304A (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59157505A (ja) * 1983-02-28 1984-09-06 Hitachi Ltd パタ−ン検査装置
JPS6057929A (ja) * 1983-09-09 1985-04-03 Hitachi Ltd パターン欠陥検出装置
JPS60233503A (ja) * 1984-05-02 1985-11-20 Matsushita Electric Works Ltd 位置検出方法
JPS61168293A (ja) * 1985-01-22 1986-07-29 日本電気株式会社 多層配線基板
JPS61251705A (ja) * 1985-04-30 1986-11-08 Sumitomo Metal Ind Ltd パタ−ン検査方法及び装置
KR100526035B1 (ko) * 2003-05-07 2005-11-08 홍성국 메탈 마스크 검사 장치 및 그의 검사 방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object
JPS5381153A (en) * 1976-12-27 1978-07-18 Hitachi Ltd Inspecting apparatus for positions of object to be inspected

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5225575A (en) * 1975-08-22 1977-02-25 Hitachi Ltd Inspection method of the state of object
JPS5381153A (en) * 1976-12-27 1978-07-18 Hitachi Ltd Inspecting apparatus for positions of object to be inspected

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59157505A (ja) * 1983-02-28 1984-09-06 Hitachi Ltd パタ−ン検査装置
JPH0160767B2 (ja) * 1983-02-28 1989-12-25 Hitachi Ltd
JPS6057929A (ja) * 1983-09-09 1985-04-03 Hitachi Ltd パターン欠陥検出装置
JPH0517481B2 (ja) * 1983-09-09 1993-03-09 Hitachi Ltd
JPS60233503A (ja) * 1984-05-02 1985-11-20 Matsushita Electric Works Ltd 位置検出方法
JPS61168293A (ja) * 1985-01-22 1986-07-29 日本電気株式会社 多層配線基板
JPS61251705A (ja) * 1985-04-30 1986-11-08 Sumitomo Metal Ind Ltd パタ−ン検査方法及び装置
JPH0513443B2 (ja) * 1985-04-30 1993-02-22 Sumitomo Metal Ind
KR100526035B1 (ko) * 2003-05-07 2005-11-08 홍성국 메탈 마스크 검사 장치 및 그의 검사 방법

Also Published As

Publication number Publication date
JPH0160766B2 (ja) 1989-12-25

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