JPS57148240A - Detecting method for defect of pattern - Google Patents

Detecting method for defect of pattern

Info

Publication number
JPS57148240A
JPS57148240A JP3444381A JP3444381A JPS57148240A JP S57148240 A JPS57148240 A JP S57148240A JP 3444381 A JP3444381 A JP 3444381A JP 3444381 A JP3444381 A JP 3444381A JP S57148240 A JPS57148240 A JP S57148240A
Authority
JP
Japan
Prior art keywords
pattern
decided
board
defect
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3444381A
Other languages
Japanese (ja)
Inventor
Yukio Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3444381A priority Critical patent/JPS57148240A/en
Publication of JPS57148240A publication Critical patent/JPS57148240A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To enable simple, reliable, and quick detecting of pattern defect of a printed circuit board, a photo mask used with the board, by a method wherein, based on an inclination coefficient of a pattern by an optical scanning, it is decided whether or not a pattern is combined with its adjoining pattern. CONSTITUTION:If a photo scanning is conducted on conductive patterns 3-5, positive or negative of an inclining pattern inclination, such as 45 deg., 90 deg., based on 2-point position of a pattern, is decided. Corresponding to a distance between the positive or the negative value and an adjacent pattern, the presence of combination of the two patterns is decided without the need for precise scanning which is performed based on statics. This causes simple, rapid, and reliable detecting of a pattern of a printed circuit board and photo mask used with the board.
JP3444381A 1981-03-10 1981-03-10 Detecting method for defect of pattern Pending JPS57148240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3444381A JPS57148240A (en) 1981-03-10 1981-03-10 Detecting method for defect of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3444381A JPS57148240A (en) 1981-03-10 1981-03-10 Detecting method for defect of pattern

Publications (1)

Publication Number Publication Date
JPS57148240A true JPS57148240A (en) 1982-09-13

Family

ID=12414376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3444381A Pending JPS57148240A (en) 1981-03-10 1981-03-10 Detecting method for defect of pattern

Country Status (1)

Country Link
JP (1) JPS57148240A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997002466A1 (en) * 1995-06-30 1997-01-23 Siemens Aktiengesellschaft Optical distance sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997002466A1 (en) * 1995-06-30 1997-01-23 Siemens Aktiengesellschaft Optical distance sensor

Similar Documents

Publication Publication Date Title
JPS5218132A (en) Binary circuit
JPS57148240A (en) Detecting method for defect of pattern
JPS57194304A (en) Inspecting method for circuit pattern
JPS56156636A (en) Mask nega pattern
JPS54114130A (en) Mark quality deciding method
JPS5238944A (en) Optical system for scanning
JPS57148239A (en) Detecting method for wiring pattern of printed circuit board
JPS57152073A (en) Original profiling reader
JPS5380168A (en) Exposure method for electronic beam
JPS5545567A (en) Method and device for soldering
JPS5390955A (en) Photoelectric detecting optical system
JPS6445865A (en) Cloth shape detecting method
JPS5724285A (en) Printing device
JPS56114704A (en) Measuring method for pattern width of printed board
JPS554982A (en) Semiconductor device manufacturing method using automatic exposure capable of fitting pattern
JPS53117463A (en) Position detection method
JPS5788727A (en) Aligning mark
JPS6450438A (en) Manufacture of hybrid integrated circuit device and substrate
JPS5717806A (en) Bridge detection method of printed circuit board
JPS52153353A (en) Ruled line pattern detector for printed matter
JPS5422727A (en) Paper detecting device
JPS5421184A (en) Manufacture for light emitting element
JPS57194530A (en) Positioning of photomask substrate
JPS5756842A (en) Hard photomask substrate and mask forming method
JPS5382451A (en) Method and apparatus of comparing and inspecting surface roughness