JPS57191218A - Equipment for forming amorphous silicon - Google Patents
Equipment for forming amorphous siliconInfo
- Publication number
- JPS57191218A JPS57191218A JP7785281A JP7785281A JPS57191218A JP S57191218 A JPS57191218 A JP S57191218A JP 7785281 A JP7785281 A JP 7785281A JP 7785281 A JP7785281 A JP 7785281A JP S57191218 A JPS57191218 A JP S57191218A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous silicon
- wall
- gas
- reaction
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7785281A JPS57191218A (en) | 1981-05-22 | 1981-05-22 | Equipment for forming amorphous silicon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7785281A JPS57191218A (en) | 1981-05-22 | 1981-05-22 | Equipment for forming amorphous silicon |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57191218A true JPS57191218A (en) | 1982-11-25 |
| JPS6116348B2 JPS6116348B2 (enrdf_load_stackoverflow) | 1986-04-30 |
Family
ID=13645584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7785281A Granted JPS57191218A (en) | 1981-05-22 | 1981-05-22 | Equipment for forming amorphous silicon |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57191218A (enrdf_load_stackoverflow) |
-
1981
- 1981-05-22 JP JP7785281A patent/JPS57191218A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6116348B2 (enrdf_load_stackoverflow) | 1986-04-30 |
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