JPS6116348B2 - - Google Patents

Info

Publication number
JPS6116348B2
JPS6116348B2 JP7785281A JP7785281A JPS6116348B2 JP S6116348 B2 JPS6116348 B2 JP S6116348B2 JP 7785281 A JP7785281 A JP 7785281A JP 7785281 A JP7785281 A JP 7785281A JP S6116348 B2 JPS6116348 B2 JP S6116348B2
Authority
JP
Japan
Prior art keywords
amorphous silicon
reaction
reaction chamber
barrier
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7785281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57191218A (en
Inventor
Micha Kamyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd, Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Co Ltd
Priority to JP7785281A priority Critical patent/JPS57191218A/ja
Publication of JPS57191218A publication Critical patent/JPS57191218A/ja
Publication of JPS6116348B2 publication Critical patent/JPS6116348B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP7785281A 1981-05-22 1981-05-22 Equipment for forming amorphous silicon Granted JPS57191218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7785281A JPS57191218A (en) 1981-05-22 1981-05-22 Equipment for forming amorphous silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7785281A JPS57191218A (en) 1981-05-22 1981-05-22 Equipment for forming amorphous silicon

Publications (2)

Publication Number Publication Date
JPS57191218A JPS57191218A (en) 1982-11-25
JPS6116348B2 true JPS6116348B2 (enrdf_load_stackoverflow) 1986-04-30

Family

ID=13645584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7785281A Granted JPS57191218A (en) 1981-05-22 1981-05-22 Equipment for forming amorphous silicon

Country Status (1)

Country Link
JP (1) JPS57191218A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS57191218A (en) 1982-11-25

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