JPS57159045A - Manufacture of multilayer wiring structure - Google Patents
Manufacture of multilayer wiring structureInfo
- Publication number
- JPS57159045A JPS57159045A JP4403181A JP4403181A JPS57159045A JP S57159045 A JPS57159045 A JP S57159045A JP 4403181 A JP4403181 A JP 4403181A JP 4403181 A JP4403181 A JP 4403181A JP S57159045 A JPS57159045 A JP S57159045A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- insulating layer
- resist
- multilayer wiring
- wiring structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To obtain a multilayer wiring structure having high accuracy and high reliability by employing positive type high molecular material resist which senses with high energy beam for the etching resist of an insulating layer. CONSTITUTION:The first insulating layer and the first layer wire conductor 2 are formed on a semiconductor substrate 1, the second insulating layer 3 is then formed on the overall surface, and radiation sensitive high molecular material film 4 of electron beam made of copolymer containing more than 10mol% of unit represented by the general formula (I) or (II) and less than 90mol% of methacrylic acid alkyl ester, methacrylic acid, methacrylonitrile or the like is used as positive resist on the layer 3, thereby etching the layer 3 in high accuracy. In the general formulae, R represents hydrogen, methyl group, methoxy group, chlorine, dimethyl amino group, and n represents the degree of polymerization.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4403181A JPS57159045A (en) | 1981-03-27 | 1981-03-27 | Manufacture of multilayer wiring structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4403181A JPS57159045A (en) | 1981-03-27 | 1981-03-27 | Manufacture of multilayer wiring structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57159045A true JPS57159045A (en) | 1982-10-01 |
Family
ID=12680264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4403181A Pending JPS57159045A (en) | 1981-03-27 | 1981-03-27 | Manufacture of multilayer wiring structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57159045A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107868065A (en) * | 2017-10-19 | 2018-04-03 | 湖北美林药业有限公司 | A kind of Flubuperone Hydrochloride compound and preparation method thereof |
-
1981
- 1981-03-27 JP JP4403181A patent/JPS57159045A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107868065A (en) * | 2017-10-19 | 2018-04-03 | 湖北美林药业有限公司 | A kind of Flubuperone Hydrochloride compound and preparation method thereof |
CN107868065B (en) * | 2017-10-19 | 2021-05-18 | 湖北美林药业有限公司 | Tolperisone hydrochloride compound and preparation method thereof |
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