JPS57145389A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPS57145389A JPS57145389A JP9530681A JP9530681A JPS57145389A JP S57145389 A JPS57145389 A JP S57145389A JP 9530681 A JP9530681 A JP 9530681A JP 9530681 A JP9530681 A JP 9530681A JP S57145389 A JPS57145389 A JP S57145389A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- optical guide
- laser device
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain the titled device wherein threshold current values are inclined and the light output is large, in the semiconducotor laser device having a double heterogeneous structure, by providing an optical guide layer at the part adjacent to an active layer, wherein the difference in the width of an inhibition band is at least 0.15 eV or more, and providing a carrier confining layer between the active layer and the optical guide layer. CONSTITUTION:On a GaAs substrate 10, an N type Ga1-xAlxAs (0.2<=x<=0.6) clad layer 1, an N type Ga1-yAlyAs (0.1<=y<=0.5) optical guide layer 2, an N type Ga1-zAlzAs (0.1<=z<=0.5) carrier confining layer 5, a Ga1-wAlwAs (0<=w<=0.3) active layer 3, and a P type Ga1-vAlvAs (0.2<=v<=0.6) clad layer 4 are laminated and grown, and they are surrounded by a Ga1-uAlAs (0.1<=u<=0.6) embedding layer 6. Then an electrode 11 is deposited on the bottom surface 1 of the substrate 10. An insulating layer 12 is provided on the layer 4. An opening is provided in the ligitudinal direction. An electrode 13 is provided so as to contact with the layer 4. A power source is connected to the electrodes 11 and 13.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9530681A JPS596079B2 (en) | 1981-06-22 | 1981-06-22 | semiconductor laser equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9530681A JPS596079B2 (en) | 1981-06-22 | 1981-06-22 | semiconductor laser equipment |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11467678A Division JPS5541741A (en) | 1978-09-20 | 1978-09-20 | Semiconductor laser device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57145389A true JPS57145389A (en) | 1982-09-08 |
JPS596079B2 JPS596079B2 (en) | 1984-02-08 |
Family
ID=14134075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9530681A Expired JPS596079B2 (en) | 1981-06-22 | 1981-06-22 | semiconductor laser equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS596079B2 (en) |
-
1981
- 1981-06-22 JP JP9530681A patent/JPS596079B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS596079B2 (en) | 1984-02-08 |
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