JPS57136361A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS57136361A JPS57136361A JP56022628A JP2262881A JPS57136361A JP S57136361 A JPS57136361 A JP S57136361A JP 56022628 A JP56022628 A JP 56022628A JP 2262881 A JP2262881 A JP 2262881A JP S57136361 A JPS57136361 A JP S57136361A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- laminated
- semiconductor device
- channel
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 239000000758 substrate Substances 0.000 abstract 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 abstract 1
- 229910001887 tin oxide Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/112—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
- H01L31/113—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor
- H01L31/1136—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor the device being a metal-insulator-semiconductor field-effect transistor
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE:To enhance photo sensibility of a laminated channel type IG semiconductor device by a method wherein a source layer, a channel layer and a drain layer are laminated on a transparent substrate, and a gate electrode is provided on the side thereof interposing an insulating film between them. CONSTITUTION:A transparent electrode 20 of tin oxide, etc., is provided on the transparent substrate 1, the amorphous or semiamorphous semiconductor layer 2 for source, the semiconductor layer 4 for channel and the semiconductor layer 5 for drain having breadth of forbidden band smaller than the layer 2 are laminated thereon, and the insulating film is provided on the side thereof. The gate electrode is provided thereon to constitute the laminated channel type insulated gate semiconductor device. Accordingly light irradiated through the substrate can be absorbed effectively to enhance sensibility.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56022628A JPS57136361A (en) | 1981-02-17 | 1981-02-17 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56022628A JPS57136361A (en) | 1981-02-17 | 1981-02-17 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57136361A true JPS57136361A (en) | 1982-08-23 |
Family
ID=12088084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56022628A Pending JPS57136361A (en) | 1981-02-17 | 1981-02-17 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57136361A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51113481A (en) * | 1975-03-28 | 1976-10-06 | Sony Corp | Semiconductor device |
JPS5515229A (en) * | 1978-07-18 | 1980-02-02 | Semiconductor Res Found | Semiconductor photograph device |
JPS5539404A (en) * | 1978-08-18 | 1980-03-19 | Hitachi Ltd | Solid state pickup device |
JPS564286A (en) * | 1979-06-25 | 1981-01-17 | Canon Inc | Photoelectric converter |
-
1981
- 1981-02-17 JP JP56022628A patent/JPS57136361A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51113481A (en) * | 1975-03-28 | 1976-10-06 | Sony Corp | Semiconductor device |
JPS5515229A (en) * | 1978-07-18 | 1980-02-02 | Semiconductor Res Found | Semiconductor photograph device |
JPS5539404A (en) * | 1978-08-18 | 1980-03-19 | Hitachi Ltd | Solid state pickup device |
JPS564286A (en) * | 1979-06-25 | 1981-01-17 | Canon Inc | Photoelectric converter |
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