JPS57114292A - Thin film image pickup element - Google Patents
Thin film image pickup elementInfo
- Publication number
- JPS57114292A JPS57114292A JP56000162A JP16281A JPS57114292A JP S57114292 A JPS57114292 A JP S57114292A JP 56000162 A JP56000162 A JP 56000162A JP 16281 A JP16281 A JP 16281A JP S57114292 A JPS57114292 A JP S57114292A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- layer
- covering
- thin film
- pickup element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title abstract 2
- 239000012212 insulator Substances 0.000 abstract 3
- 239000010408 film Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 241000138806 Impages Species 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000002161 passivation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/024—Details of scanning heads ; Means for illuminating the original
- H04N1/028—Details of scanning heads ; Means for illuminating the original for picture information pick-up
- H04N1/02805—Details of scanning heads ; Means for illuminating the original for picture information pick-up with photodetectors arranged in a two-dimensional array
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/108—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the Schottky type
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/024—Details of scanning heads ; Means for illuminating the original
- H04N1/028—Details of scanning heads ; Means for illuminating the original for picture information pick-up
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Facsimile Heads (AREA)
Abstract
PURPOSE:To reduce the size of an impage pickup element by superposing a photoelectric converter on a substrate made of glass or ceramics and further forming a switching unit of thin film and a wire of multilayer on the upper side of the converter CONSTITUTION:A photoelectric converter 13 is formed via a transparent substrate 1, a transparent electrode 2, the first semiconductor layer 3, an opaque electrode 5 and the first insulator film 6. There are further formed the first top electrode 7a contacted with the upper surface of the first insulator layer 6 and connected through a contacting hole 16 with the electrode 5, the second upper electrode 7b faced with the electrode 7a, and the second semiconductor layer 8 covering the electrodes. There are further formed the second insulator layer 9 covering the layer 8, a gate electrode 10 contacted on the upper surface of the layer 9 and formed to cotrol the current channel, and a passivation film 11 covering the electrpdes to form a switching element 12.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56000162A JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
US06/336,991 US4471371A (en) | 1981-01-06 | 1982-01-04 | Thin film image pickup element |
US06/582,642 US4517733A (en) | 1981-01-06 | 1984-02-22 | Process for fabricating thin film image pick-up element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56000162A JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57114292A true JPS57114292A (en) | 1982-07-16 |
JPS6258550B2 JPS6258550B2 (en) | 1987-12-07 |
Family
ID=11466338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56000162A Granted JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57114292A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59126666A (en) * | 1983-01-10 | 1984-07-21 | Seiko Epson Corp | Solid-image sensor |
JPS59185474A (en) * | 1983-04-04 | 1984-10-22 | Seiko Epson Corp | Solid-state image sensor |
JPS59188168A (en) * | 1983-04-08 | 1984-10-25 | Seiko Epson Corp | Solid state image sensor |
EP0177275A2 (en) * | 1984-09-29 | 1986-04-09 | Kabushiki Kaisha Toshiba | Photosensor suited for image sensor |
JPH0620568U (en) * | 1992-02-29 | 1994-03-18 | 株式会社ノーリツ | Extension device for drain trap |
JP2011139069A (en) * | 2009-12-30 | 2011-07-14 | Commissariat A L'energie Atomique & Aux Energies Alternatives | Integrated diamond transduction pixelized imaging device and method of manufacturing the same |
-
1981
- 1981-01-06 JP JP56000162A patent/JPS57114292A/en active Granted
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59126666A (en) * | 1983-01-10 | 1984-07-21 | Seiko Epson Corp | Solid-image sensor |
JPS59185474A (en) * | 1983-04-04 | 1984-10-22 | Seiko Epson Corp | Solid-state image sensor |
JPS59188168A (en) * | 1983-04-08 | 1984-10-25 | Seiko Epson Corp | Solid state image sensor |
JPH0526347B2 (en) * | 1983-04-08 | 1993-04-15 | Seiko Epson Corp | |
EP0177275A2 (en) * | 1984-09-29 | 1986-04-09 | Kabushiki Kaisha Toshiba | Photosensor suited for image sensor |
US4823178A (en) * | 1984-09-29 | 1989-04-18 | Kabushiki Kaisha Toshiba | Photosensor suited for image sensor |
JPH0620568U (en) * | 1992-02-29 | 1994-03-18 | 株式会社ノーリツ | Extension device for drain trap |
JP2011139069A (en) * | 2009-12-30 | 2011-07-14 | Commissariat A L'energie Atomique & Aux Energies Alternatives | Integrated diamond transduction pixelized imaging device and method of manufacturing the same |
JP2017120266A (en) * | 2009-12-30 | 2017-07-06 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | Integrated diamond conversion pixelated imaging device and method of manufacturing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6258550B2 (en) | 1987-12-07 |
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