JPS57124731A - Negative type resist with dry etching resistance - Google Patents

Negative type resist with dry etching resistance

Info

Publication number
JPS57124731A
JPS57124731A JP1017081A JP1017081A JPS57124731A JP S57124731 A JPS57124731 A JP S57124731A JP 1017081 A JP1017081 A JP 1017081A JP 1017081 A JP1017081 A JP 1017081A JP S57124731 A JPS57124731 A JP S57124731A
Authority
JP
Japan
Prior art keywords
dry etching
polymer
negative type
etching resistance
type resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1017081A
Other languages
Japanese (ja)
Inventor
Katsuyuki Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1017081A priority Critical patent/JPS57124731A/en
Publication of JPS57124731A publication Critical patent/JPS57124731A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To obtain a negative type resist material of high performance made of specified methacrylate polymer, forming a micropattern by electron beam or X-ray lithography, and applicable to dry etching. CONSTITUTION:A resist is formed with a polymer having repeating units represented by formulaI. Methacrylate corresponding to each unit of formulaI is prepared by reacting methacrylic acid or a reactive acid deriv. thereof with p-, m- or o-bromo- or -chloro-substituted phenol or benzyl alcohol. The dry etching resistance of the resulting resist material is produced by benzene rings having a protective effect in the polymer.
JP1017081A 1981-01-28 1981-01-28 Negative type resist with dry etching resistance Pending JPS57124731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1017081A JPS57124731A (en) 1981-01-28 1981-01-28 Negative type resist with dry etching resistance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1017081A JPS57124731A (en) 1981-01-28 1981-01-28 Negative type resist with dry etching resistance

Publications (1)

Publication Number Publication Date
JPS57124731A true JPS57124731A (en) 1982-08-03

Family

ID=11742800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1017081A Pending JPS57124731A (en) 1981-01-28 1981-01-28 Negative type resist with dry etching resistance

Country Status (1)

Country Link
JP (1) JPS57124731A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168047A (en) * 1982-03-30 1983-10-04 Somar Corp Photosensitive material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168047A (en) * 1982-03-30 1983-10-04 Somar Corp Photosensitive material
JPH0334057B2 (en) * 1982-03-30 1991-05-21 Somar Corp

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